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Published in: Polymer Science, Series D 2/2022

01-06-2022

A Composition Based on a Siloxane Block Copolymer with a Linear-Ladder Structure Intended for Use in Electronic Instrumentation

Authors: O. V. Neelova, D. G. Shutov

Published in: Polymer Science, Series D | Issue 2/2022

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Abstract

A two-component organosilicon composition of KKP-grade compound has been developed based on a binary system of polymers, a block copolymer of linear-ladder structure containing linear polydimethylsiloxane and ladder phenylsilsesquioxane links, and an epoxy-organosilicon resin that represents a product of epoxy resin modification. A solution of aluminum acetylacetonate in triethoxysilane has been used as a curing system. It is shown that the developed compound, as concerns electric-insulating and moistureproof properties; adhesion to silicon, aluminum, and copper; and the absence of corrosive impact on aluminum and copper, as well as due to having a minimum content of ionic impurities, is superior to such domestic analogues as the EP-9114 varnish and UR-231 varnish widely used as moisture-protective coatings in manufacturing electronic equipment and electronic components.

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Metadata
Title
A Composition Based on a Siloxane Block Copolymer with a Linear-Ladder Structure Intended for Use in Electronic Instrumentation
Authors
O. V. Neelova
D. G. Shutov
Publication date
01-06-2022
Publisher
Pleiades Publishing
Published in
Polymer Science, Series D / Issue 2/2022
Print ISSN: 1995-4212
Electronic ISSN: 1995-4220
DOI
https://doi.org/10.1134/S1995421222020174

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