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Microsystem Technologies
Published in: Microsystem Technologies 3-4/2007

01-02-2007 | Technical paper

A new removable resist for high aspect ratio applications

Authors: Matthias Schirmer, Doris Perseke, Eva Zena, Daniel Schondelmaier, Ivo Rudolph, Bernd Loechel

Published in: Microsystem Technologies | Issue 3-4/2007

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Abstract

A variety of different photo resists are used for fabrication of MEMS. Presently good results were reported for SU-8, a chemically amplified negative tone photoresist. But SU-8 has a disadvantage for some applications in LIGA technique, especially in the X-ray mask fabrication. After processing the finished resist pattern are hardly soluble from the substrate. This paper will briefly describe the current status of the development of the new negative tone photoresist CAR 44 whose big advantage is the easy removableness of the cross linked pattern.
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Metadata
Title
A new removable resist for high aspect ratio applications
Authors
Matthias Schirmer
Doris Perseke
Eva Zena
Daniel Schondelmaier
Ivo Rudolph
Bernd Loechel
Publication date
01-02-2007
Publisher
Springer-Verlag
Published in
Microsystem Technologies / Issue 3-4/2007
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-006-0189-9

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