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Published in:
01-04-2009
Micro-porous silicon structure with low optical reflection
Published in: Journal of Materials Science: Materials in Electronics | Issue 4/2009
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Abstract
A porous silicon structure with good physical and optical characteristics was made by a novel method. In this method, an amorphous silicon film with many fine grains was used as micro-mask. When the sample was subjected to etching process, the presence of fine grain boundaries resulted in selective etching on the surface of silicon wafer. The completed sample showed a low-reflective silicon wafer with a complex morphology. When a light illuminated on this proposed structure, there was nearly no optical reflection to be detected. This indicates that the new porous silicon structure can act as a good light-trapper.