Skip to main content
Top
Published in: Journal of Materials Science: Materials in Electronics 23/2020

17-10-2020

Morphology regulation of TiO2 thin film by ALD growth temperature and its applications to encapsulation and light extraction

Authors: Xiaocong Lai, Yalian Weng, Guixiong Chen, Sihua Que, Xiongtu Zhou, Qun Yan, Chaoxing Wu, Tailiang Guo, Jie Sun, Yongai Zhang

Published in: Journal of Materials Science: Materials in Electronics | Issue 23/2020

Log in

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

Abstract

As a multi-functional material, TiO2 thin film has been widely studied and applied in display, photocatalysis, solar cells and other fields. In this work, TiO2 thin films were prepared using atomic layer deposition, and their morphology was successfully regulated by the growth temperature. It was found that TiO2 film prepared at low temperature was amorphous, uniform and dense, with great barrier property, which can be used for encapsulation. Crystalline TiO2 nanoparticles with anatase phase appeared at higher temperature than 150 °C, whose amount increased with the growth temperature. The crystalline TiO2 particles can be used as templates to prepare randomly textured nano-patterns, which were proved to be able to improve the light extraction efficiency of photoelectric devices. Specifically, the luminance efficiency of the QLED with the nano-patterns formed by the crystalline TiO2 particle prepared at 200 °C and 250 °C were increased by 24.07% and 30.44%, respectively.

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Springer Professional "Wirtschaft"

Online-Abonnement

Mit Springer Professional "Wirtschaft" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 340 Zeitschriften

aus folgenden Fachgebieten:

  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Versicherung + Risiko




Jetzt Wissensvorsprung sichern!

Literature
1.
go back to reference L.H. Kim, K. Kim, S. Park, Y.J. Jeong, H. Kim, D.S. Chung, S.H. Kim, C.E. Park, A.C.S. Appl, Mater. Interfaces 6, 6731 (2014) L.H. Kim, K. Kim, S. Park, Y.J. Jeong, H. Kim, D.S. Chung, S.H. Kim, C.E. Park, A.C.S. Appl, Mater. Interfaces 6, 6731 (2014)
2.
go back to reference D. Muñoz-Rojas, H. Sun, D.C. Iza, J. Weickert, L. Chen, H. Wang, L. Schmidt-Mende, J.L. MacManus-Driscoll, Prog. Photovolt: Res. Appl. 21, 393 (2013) D. Muñoz-Rojas, H. Sun, D.C. Iza, J. Weickert, L. Chen, H. Wang, L. Schmidt-Mende, J.L. MacManus-Driscoll, Prog. Photovolt: Res. Appl. 21, 393 (2013)
3.
go back to reference I. Iatsunskyi, E. Coy, R. Viter, G. Nowaczyk, M. Jancelewicz, I. Baleviciute, K. Załęski, S. Jurga, J. Phys. Chem. C 119, 20591 (2015) I. Iatsunskyi, E. Coy, R. Viter, G. Nowaczyk, M. Jancelewicz, I. Baleviciute, K. Załęski, S. Jurga, J. Phys. Chem. C 119, 20591 (2015)
4.
go back to reference D.H. Kim, M. Woodroof, K. Lee, G.N. Parsons, Chemsuschem 6, 1014 (2013) D.H. Kim, M. Woodroof, K. Lee, G.N. Parsons, Chemsuschem 6, 1014 (2013)
5.
go back to reference C. Ros, T. Andreu, M.D. Hernandez-Alonso, G. Penelas-Perez, J. Arbiol, J.R. Morante, A.C.S. Appl, Mater. Interfaces 9, 17932 (2017) C. Ros, T. Andreu, M.D. Hernandez-Alonso, G. Penelas-Perez, J. Arbiol, J.R. Morante, A.C.S. Appl, Mater. Interfaces 9, 17932 (2017)
6.
go back to reference A. Baktash, O. Amiri, M. Saadat, J. Nanostruct 10, 119 (2020) A. Baktash, O. Amiri, M. Saadat, J. Nanostruct 10, 119 (2020)
7.
go back to reference D. Dastan, A. Banpurkar, J. Mater. Sci. Mater. Electron. 28, 3851 (2017) D. Dastan, A. Banpurkar, J. Mater. Sci. Mater. Electron. 28, 3851 (2017)
8.
go back to reference T. Nabatame, A. Ohi, T. Chikyo, M. Kimura, H. Yamada, T. Ohishi, J. Vac. Sci. Technol. B 32, 03D121 (2014) T. Nabatame, A. Ohi, T. Chikyo, M. Kimura, H. Yamada, T. Ohishi, J. Vac. Sci. Technol. B 32, 03D121 (2014)
9.
go back to reference C. Adler, D. Mitoraj, I. Krivtsov, R. Beranek, J. Chem. Phys. 153, 244702 (2020) C. Adler, D. Mitoraj, I. Krivtsov, R. Beranek, J. Chem. Phys. 153, 244702 (2020)
10.
go back to reference C. Bian, W.S. Yang, G.J. Zhu, S. Feng, J.J. Zhang, R. Xu, X.X. Zhang, W.Y. Fu, H.B. Yang, J. Mater. Sci. Mater. Electron. 31, 9961 (2020) C. Bian, W.S. Yang, G.J. Zhu, S. Feng, J.J. Zhang, R. Xu, X.X. Zhang, W.Y. Fu, H.B. Yang, J. Mater. Sci. Mater. Electron. 31, 9961 (2020)
11.
go back to reference J. Aarik, A. Aidla, H. Mandar, V. Sammelselg, J. Cryst. Growth 220, 531 (2000) J. Aarik, A. Aidla, H. Mandar, V. Sammelselg, J. Cryst. Growth 220, 531 (2000)
12.
go back to reference B. Meryem, K. Ismail, G. Meryem Polat, Z. Recep, O. Ali Kemal, A. Hakan, J. Mater. Sci. Eng. B 9, 32 (2019) B. Meryem, K. Ismail, G. Meryem Polat, Z. Recep, O. Ali Kemal, A. Hakan, J. Mater. Sci. Eng. B 9, 32 (2019)
13.
go back to reference W. Chiappim, G.E. Testoni, J.S.B. de Lima, H.S. Medeiros, R.S. Pessoa, K.G. Grigorov, L. Vieira, H.S. Maciel, Braz. J. Phys. 46, 56 (2016) W. Chiappim, G.E. Testoni, J.S.B. de Lima, H.S. Medeiros, R.S. Pessoa, K.G. Grigorov, L. Vieira, H.S. Maciel, Braz. J. Phys. 46, 56 (2016)
14.
go back to reference C.H. Hsu, K.T. Chen, P.H. Huang, W.Y. Wu, X.Y. Zhang, C. Wang, L.S. Liang, P. Gao, Y. Qiu, S.Y. Lien, Z.B. Su, Z.R. Chen, W.Z. Zhu, Nanomaterials 10, 1322 (2020) C.H. Hsu, K.T. Chen, P.H. Huang, W.Y. Wu, X.Y. Zhang, C. Wang, L.S. Liang, P. Gao, Y. Qiu, S.Y. Lien, Z.B. Su, Z.R. Chen, W.Z. Zhu, Nanomaterials 10, 1322 (2020)
15.
17.
go back to reference L.Q. Jing, Z.H. Sun, B.Q. Wang, Y.C. Qu, H.G. Fu, J. Inorg. Mater. 20, 789 (2005) L.Q. Jing, Z.H. Sun, B.Q. Wang, Y.C. Qu, H.G. Fu, J. Inorg. Mater. 20, 789 (2005)
18.
go back to reference M. Aghaee, J. Verheyen, A.A.E. Stevens, W.M.M. Kessels, M. Creatore, Plasma Process. Polym. 16, e1900127 (2019) M. Aghaee, J. Verheyen, A.A.E. Stevens, W.M.M. Kessels, M. Creatore, Plasma Process. Polym. 16, e1900127 (2019)
19.
go back to reference M.F. Hossain, S. Naka, H. Okada, J. Photochem. Photobiol. A 360, 109 (2018) M.F. Hossain, S. Naka, H. Okada, J. Photochem. Photobiol. A 360, 109 (2018)
20.
go back to reference Y. Weng, G. Chen, X. Zhou, Q. Yan, T. Guo, Y. Zhang, Nanotechnology 30, 085702 (2019) Y. Weng, G. Chen, X. Zhou, Q. Yan, T. Guo, Y. Zhang, Nanotechnology 30, 085702 (2019)
21.
go back to reference Y.H. Wang, K.H. Rahman, C.C. Wu, K.C. Chen, Catalysts 10, 598 (2020) Y.H. Wang, K.H. Rahman, C.C. Wu, K.C. Chen, Catalysts 10, 598 (2020)
22.
go back to reference M.P. Gonullu, H. Ates, Superlattice Microst. 142, 106529 (2020) M.P. Gonullu, H. Ates, Superlattice Microst. 142, 106529 (2020)
23.
go back to reference K. Kukli, M. Ritala, M. Schuisky, M. Leskela, T. Sajavaara, J. Keinonen, T. Uustare, A. Harsta, Chem. Vapor Depos. 6, 303 (2000) K. Kukli, M. Ritala, M. Schuisky, M. Leskela, T. Sajavaara, J. Keinonen, T. Uustare, A. Harsta, Chem. Vapor Depos. 6, 303 (2000)
24.
go back to reference J. Aarik, A. Aidla, H. Mandar, T. Uustare, Appl. Surf. Sci. 172, 148 (2001) J. Aarik, A. Aidla, H. Mandar, T. Uustare, Appl. Surf. Sci. 172, 148 (2001)
25.
go back to reference C.C. Wang, J.W. Lin, Y.H. Yu, K.H. Lai, S.M. Lee, K.F. Chiu, C.C. Kei, J. Alloys Compd. 842, 155845 (2020) C.C. Wang, J.W. Lin, Y.H. Yu, K.H. Lai, S.M. Lee, K.F. Chiu, C.C. Kei, J. Alloys Compd. 842, 155845 (2020)
26.
go back to reference G. Chen, Y. Weng, F. Sun, X. Zhou, C. Wu, Q. Yan, T. Guo, Y. Zhang, RSC Adv. 9, 20884 (2019) G. Chen, Y. Weng, F. Sun, X. Zhou, C. Wu, Q. Yan, T. Guo, Y. Zhang, RSC Adv. 9, 20884 (2019)
27.
go back to reference J. Aarik, A. Aidla, T. Uustare, V. Sammelselg, J. Cryst. Growth 148, 268 (1995) J. Aarik, A. Aidla, T. Uustare, V. Sammelselg, J. Cryst. Growth 148, 268 (1995)
28.
go back to reference J. Aarik, J. Karlis, H. Mandar, T. Uustare, V. Sammelselg, Appl. Surf. Sci. 181, 339 (2001) J. Aarik, J. Karlis, H. Mandar, T. Uustare, V. Sammelselg, Appl. Surf. Sci. 181, 339 (2001)
29.
go back to reference Y. Wei, M.V. Tokina, A.V. Benderskii, Z. Zhou, R. Long, O.V. Prezhdo, J. Chem. Phys. 153, 044706 (2020) Y. Wei, M.V. Tokina, A.V. Benderskii, Z. Zhou, R. Long, O.V. Prezhdo, J. Chem. Phys. 153, 044706 (2020)
30.
go back to reference S. Kang, C.W. Joo, B.H. Ha, J. Kim, J. Lee, B.G. Yu, N.S. Cho, J. Noh, J. Moon, J. Lumin. 205, 66 (2019) S. Kang, C.W. Joo, B.H. Ha, J. Kim, J. Lee, B.G. Yu, N.S. Cho, J. Noh, J. Moon, J. Lumin. 205, 66 (2019)
31.
go back to reference S. Chen, H.S. Kwok, Opt. Express 18, 37 (2010) S. Chen, H.S. Kwok, Opt. Express 18, 37 (2010)
32.
go back to reference A.C. Bronneberg, C. Hoehn, R. van de Krol, J. Phys. Chem. C 121, 5531 (2017) A.C. Bronneberg, C. Hoehn, R. van de Krol, J. Phys. Chem. C 121, 5531 (2017)
33.
go back to reference T. Potlog, P. Dumitriu, M. Dobromir, D. Luca, J. Mater. Sci. Eng. B 4, 163 (2014) T. Potlog, P. Dumitriu, M. Dobromir, D. Luca, J. Mater. Sci. Eng. B 4, 163 (2014)
34.
go back to reference J.Y. Zhang, I.W. Boyd, B.J. O’Sullivan, P.K. Hurley, P.V. Kelly, J.P. Seenateur, J. Non-Cryst, Solids 303, 134 (2002) J.Y. Zhang, I.W. Boyd, B.J. O’Sullivan, P.K. Hurley, P.V. Kelly, J.P. Seenateur, J. Non-Cryst, Solids 303, 134 (2002)
35.
go back to reference R. Shakoury, A. Arman, S. Talu, D. Dastan, C. Luna, S. Rezaee, Opt. Quant. Electron. 52, 270 (2020) R. Shakoury, A. Arman, S. Talu, D. Dastan, C. Luna, S. Rezaee, Opt. Quant. Electron. 52, 270 (2020)
36.
go back to reference D. Dastan, N. Chaure, M. Kartha, J. Mater. Sci.: Mater. Electron. 28, 7784 (2017) D. Dastan, N. Chaure, M. Kartha, J. Mater. Sci.: Mater. Electron. 28, 7784 (2017)
37.
go back to reference D. Dastan, P.U. Londhe, N.B. Chaure, J. Mater. Sci.: Mater. Electron. 25, 3473 (2014) D. Dastan, P.U. Londhe, N.B. Chaure, J. Mater. Sci.: Mater. Electron. 25, 3473 (2014)
38.
go back to reference D. Dastan, S.L. Panahi, N.B. Chaure, J. Mater. Sci.: Mater. Electron. 27, 12291 (2016) D. Dastan, S.L. Panahi, N.B. Chaure, J. Mater. Sci.: Mater. Electron. 27, 12291 (2016)
39.
go back to reference K. Shan, Z.Z. Yi, D. Dastan, H. Garmestani, Dalton Trans. 49, 6682 (2020) K. Shan, Z.Z. Yi, D. Dastan, H. Garmestani, Dalton Trans. 49, 6682 (2020)
40.
go back to reference K. Shan, Z.Z. Yi, D. Dastan, H. Garmestani, Dalton Trans. 49, 8549 (2020) K. Shan, Z.Z. Yi, D. Dastan, H. Garmestani, Dalton Trans. 49, 8549 (2020)
41.
go back to reference Y. Zhu, H. Hu, Y. Liu, M. Chen, W. Lin, Y. Ye, T. Guo, F. Li, Org. Electron. 70, 279 (2019) Y. Zhu, H. Hu, Y. Liu, M. Chen, W. Lin, Y. Ye, T. Guo, F. Li, Org. Electron. 70, 279 (2019)
42.
go back to reference Z. Wu, P. Liu, W. Zhang, K. Wang, X.W. Sun, ACS Energy Lett. 5, 1095 (2020) Z. Wu, P. Liu, W. Zhang, K. Wang, X.W. Sun, ACS Energy Lett. 5, 1095 (2020)
43.
go back to reference M. Lu, J. Guo, S. Sun, P. Lu, J. Wu, Y. Wang, S.V. Kershaw, W.W. Yu, A.L. Rogach, Y. Zhang, Nano Lett. 20, 2829 (2020) M. Lu, J. Guo, S. Sun, P. Lu, J. Wu, Y. Wang, S.V. Kershaw, W.W. Yu, A.L. Rogach, Y. Zhang, Nano Lett. 20, 2829 (2020)
44.
go back to reference X. Yang, K. Dev, J. Wang, E. Mutlugun, C. Dang, Y. Zhao, S. Liu, Y. Tang, S.T. Tan, X.W. Sun, H.V. Demir, Adv. Funct. Mater. 24, 5977 (2014) X. Yang, K. Dev, J. Wang, E. Mutlugun, C. Dang, Y. Zhao, S. Liu, Y. Tang, S.T. Tan, X.W. Sun, H.V. Demir, Adv. Funct. Mater. 24, 5977 (2014)
45.
go back to reference J.H. Oh, D.B. Choi, K.H. Lee, H. Yang, Y.R. Do, IEEE J. Sel. Top. Quantum Electron. 22, 2000206 (2016) J.H. Oh, D.B. Choi, K.H. Lee, H. Yang, Y.R. Do, IEEE J. Sel. Top. Quantum Electron. 22, 2000206 (2016)
46.
go back to reference S. Wang, C. Li, Y. Xiang, H. Qi, Y. Fang, A. Wang, H. Shen, Z. Du, Nanoscale Adv. 2, 1967 (2020) S. Wang, C. Li, Y. Xiang, H. Qi, Y. Fang, A. Wang, H. Shen, Z. Du, Nanoscale Adv. 2, 1967 (2020)
47.
Metadata
Title
Morphology regulation of TiO2 thin film by ALD growth temperature and its applications to encapsulation and light extraction
Authors
Xiaocong Lai
Yalian Weng
Guixiong Chen
Sihua Que
Xiongtu Zhou
Qun Yan
Chaoxing Wu
Tailiang Guo
Jie Sun
Yongai Zhang
Publication date
17-10-2020
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 23/2020
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-020-04643-6

Other articles of this Issue 23/2020

Journal of Materials Science: Materials in Electronics 23/2020 Go to the issue