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Published in: Journal of Electronic Materials 9/2022

24-05-2022 | 2021 U.S. Workshop on Physics and Chemistry of II-VI Materials

Plasma Treatment for Surface Stabilization in InAs/GaSb Type-II Superlattice LWIR and VLWIR Photodetectors

Authors: Hyun-Jin Lee, Young Chul Kim, Jun Ho Eom, Hyun Chul Jung, Ko-Ku Kang, Seong Min Ryu, Ahreum Jang, Tae Hee Lee, Jong Gi Kim, Young Ho Kim, Han Jung

Published in: Journal of Electronic Materials | Issue 9/2022

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Abstract

An InAs/GaSb nBn structure was investigated as a replacement for mercury cadmium telluride (MCT) in long-wavelength infrared (LWIR) and very long-wavelength infrared (VLWIR) detectors, which is advantageous for detection of low-temperature objects. In antimony (Sb)-based III-V compounds, native oxides are easily generated during the process, and these contribute to the surface leakage current. Therefore, a key factor determining device performance is ensuring that native oxides are minimized and the surface is stabilized. Various wet solution-based treatments have been studied. Although wet treatments are effective for surface stabilization, native oxides can be regenerated by subsequent exposure to air or water. In this work, plasma treatments were investigated as an alternative to wet treatment. It was found that hydrogen (H2) plasma treatment effectively reduced the native oxides, and trifluoromethane (CHF3) plasma treatment inhibited the regeneration of the native oxides by coated polytetrafluoroethylene (PTFE) film. The LWIR and VLWIR devices fabricated with these plasma treatments exhibited a dark current density close to MCT rule 07. The proposed plasma treatments could be useful for enhancing the performance of type-II superlattice (T2SL)-based LWIR and VLWIR detectors.

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Metadata
Title
Plasma Treatment for Surface Stabilization in InAs/GaSb Type-II Superlattice LWIR and VLWIR Photodetectors
Authors
Hyun-Jin Lee
Young Chul Kim
Jun Ho Eom
Hyun Chul Jung
Ko-Ku Kang
Seong Min Ryu
Ahreum Jang
Tae Hee Lee
Jong Gi Kim
Young Ho Kim
Han Jung
Publication date
24-05-2022
Publisher
Springer US
Published in
Journal of Electronic Materials / Issue 9/2022
Print ISSN: 0361-5235
Electronic ISSN: 1543-186X
DOI
https://doi.org/10.1007/s11664-022-09703-7

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