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Microsystem Technologies
Published in: Microsystem Technologies 8-9/2010

01-08-2010 | Technical Paper

RMS voltage sensor based on a variable parallel-plate capacitor made of electroplated copper

Authors: Jan Dittmer, Lars Hecht, Rolf Judaschke, Stephanus Büttgenbach

Published in: Microsystem Technologies | Issue 8-9/2010

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Abstract

We present an advanced RMS voltage sensor based on a variable parallel-plate capacitor using the principle of electrostatic force. The device is fabricated in a micromechanical surface process with a high-aspect ratio actuator, reinforced by copper electroplating employing a sacrificial photo-resist layer. Another copper layer with a coplanar waveguide below the actuator provides separated excitation and sensing electrodes. Flip-chip technology is employed for low-loss electrical connectivity. The presented design has a plate area of up to 3 × 3 mm2 and an initial gap distance of only 1.5 μm. We present results achieving a pull-in voltage below 1 V at frequencies from DC up to 1 GHz and sensitivities up to 1 fF/mV.
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Literature
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Metadata
Title
RMS voltage sensor based on a variable parallel-plate capacitor made of electroplated copper
Authors
Jan Dittmer
Lars Hecht
Rolf Judaschke
Stephanus Büttgenbach
Publication date
01-08-2010
Publisher
Springer-Verlag
Published in
Microsystem Technologies / Issue 8-9/2010
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-009-1016-x

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