Skip to main content
Top

1984 | OriginalPaper | Chapter

Secondary Ion Emission from Si Subjected to Oxygen Ion Bombardment

Authors : T. Ohwaki, Y. Taga, K. Satta

Published in: Secondary Ion Mass Spectrometry SIMS IV

Publisher: Springer Berlin Heidelberg

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

In practical SIMS ,O2+ ion beam is generally used as primary species. However there have been little systematic and reliable data on the yields of spattering and secondary ion emission from a material subjected to 02+ ion bombardment[1,2,3,4,5].On the other hand,an understanding of secondary ion emission mechanism requires the measurements of secondary ion yields and energy distribution [6,7,8]. In this paper,we describe the results of secondary ion emission from Si under O2+ ion bombardment.

Metadata
Title
Secondary Ion Emission from Si Subjected to Oxygen Ion Bombardment
Authors
T. Ohwaki
Y. Taga
K. Satta
Copyright Year
1984
Publisher
Springer Berlin Heidelberg
DOI
https://doi.org/10.1007/978-3-642-82256-8_9