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1984 | OriginalPaper | Chapter

Sputtering and Secondary Ion Yields of Ti-Al Alloys Subjected to Oxygen Ion Bombardment

Authors : K. Inoue, Y. Taga, K. Satta

Published in: Secondary Ion Mass Spectrometry SIMS IV

Publisher: Springer Berlin Heidelberg

Included in: Professional Book Archive

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A principal approach to the fundamental understanding of SIMS process requires the accumulation of reliable data. Recently, we determined the yields of sputtering and secondary ion emission of pure metals under oxygen ion bombardment, and found some factors governing fundamental phenomena of SIMS[1].

previous chapter Sputtered Atom Yields and Ionization Probabilities of Binary Alloys Under O 2 + Bombardment

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Title: Sputtering and Secondary Ion Yields of Ti-Al Alloys Subjected to Oxygen Ion Bombardment
Authors: K. Inoue
Y. Taga
K. Satta
Publisher: Springer Berlin Heidelberg
Book: Secondary Ion Mass Spectrometry SIMS IV
Print ISBN: 978-3-642-82258-2

Electronic ISBN: 978-3-642-82256-8

Copyright Year: 1984
DOI: https://doi.org/10.1007/978-3-642-82256-8_3