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Advances in Manufacturing
Published in: Advances in Manufacturing 3/2013

01-09-2013

Effect of substrates and underlayer on CNT synthesis by plasma enhanced CVD

Authors: Liang Xu, Di Jiang, Yi-Feng Fu, Stephane Xavier, Shailendra Bansropun, Afshin Ziaei, Shan-Tung Tu, Johan Liu

Published in: Advances in Manufacturing | Issue 3/2013

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Abstract

Due to their unique thermal, electronic and mechanical properties, carbon nanotubes (CNTs) have aroused various attentions of many researchers. Among all the techniques to fabricate CNTs, plasma enhanced chemical vapor deposition (PECVD) has been extensively developed as one growth technique to produce vertically-aligned carbon nanotubes (VACNTs). Though CNTs show a trend to be integrated into nanoelectromechanical system (NEMS), CNT growth still remains a mysterious technology. This paper attempts to reveal the effects of substrates and underlayers to CNT synthesis. We tried five different substrates by substituting intrinsic Si with high resistivity ones and by increasing the thickness of SiO2 insulativity layer. And also, we demonstrated an innovative way of adjusting CNT density by changing the thickness of Cu underlayer.
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Metadata
Title
Effect of substrates and underlayer on CNT synthesis by plasma enhanced CVD
Authors
Liang Xu
Di Jiang
Yi-Feng Fu
Stephane Xavier
Shailendra Bansropun
Afshin Ziaei
Shan-Tung Tu
Johan Liu
Publication date
01-09-2013
Publisher
Springer Berlin Heidelberg
Published in
Advances in Manufacturing / Issue 3/2013
Print ISSN: 2095-3127
Electronic ISSN: 2195-3597
DOI
https://doi.org/10.1007/s40436-013-0036-z

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