2001 | OriginalPaper | Chapter
Investigation of a Novel Rapid Thermal Processing Concept Using an Electro-Optically Controlled Radiation Cavity
Authors : N. E. B. Cowern, F. Roozeboom, P. Van der Sluis
Published in: Simulation of Semiconductor Processes and Devices 2001
Publisher: Springer Vienna
Included in: Professional Book Archive
Activate our intelligent search to find suitable subject content or patents.
Select sections of text to find matching patents with Artificial Intelligence. powered by
Select sections of text to find additional relevant content using AI-assisted search. powered by
We present numerical investigations of a novel technique for reducing the thermal cycle during lamp-heated rapid-thermal processing (RTP). In our concept the reflective reactor-wall surface is replaced by an electro-optically switchable film, which allows efficient heating and subsequent radiative cooling of processed wafers. Our approach provides an efficient solution to ultrashallow junction requirements for forthcoming CMOS generations.