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2001 | OriginalPaper | Chapter

Investigation of a Novel Rapid Thermal Processing Concept Using an Electro-Optically Controlled Radiation Cavity

Authors : N. E. B. Cowern, F. Roozeboom, P. Van der Sluis

Published in: Simulation of Semiconductor Processes and Devices 2001

Publisher: Springer Vienna

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We present numerical investigations of a novel technique for reducing the thermal cycle during lamp-heated rapid-thermal processing (RTP). In our concept the reflective reactor-wall surface is replaced by an electro-optically switchable film, which allows efficient heating and subsequent radiative cooling of processed wafers. Our approach provides an efficient solution to ultrashallow junction requirements for forthcoming CMOS generations.

Metadata
Title
Investigation of a Novel Rapid Thermal Processing Concept Using an Electro-Optically Controlled Radiation Cavity
Authors
N. E. B. Cowern
F. Roozeboom
P. Van der Sluis
Copyright Year
2001
Publisher
Springer Vienna
DOI
https://doi.org/10.1007/978-3-7091-6244-6_78