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Journal of Sol-Gel Science and Technology

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14-02-2018 | Original Paper: Sol-gel and hybrid materials for dielectric, electronic, magnetic and ferroelectric applications

Novel adamantane-based periodic mesoporous organosilica film with ultralow dielectric constant and high mechanical strength

Authors: Guoping Zhang, Jiawei Zhang, Fangfang Niu, Fan Zhang, Songfang Zhao, Mingliang Wang, Yongju Gao, Rong Sun, Chingping Wong

Published in: Journal of Sol-Gel Science and Technology | Issue 3/2018

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Abstract

In this work, a novel bridged organosilane precursor, adamantane-bridged organosilane (ADBO), was synthesized successfully which was employed to prepare adamantane-based (ADH-based) periodic mesoporous organosilica (PMO) thin film in the presence of porogen and acid catalyst via evaporation-induced self-assembly (EISA) after spin-coating procedure. The resultant ADH-based PMO thin films were characterized by FTIR, NMR, TEM, and small-angle XRD. The ADH-based PMO thin film with weight ratio of porogen to ADBO (0.75:1) possesses low dielectric constant (1.55 ± 0.04@1 MHz), excellent Young’s modulus (6.69 ± 0.54 GPa), and ideal hydrophobic property (90.2° of water contact angle) simultaneously. These outstanding properties of ADH-based PMO film can be ascribed to lower polarity, lower density, and rigid cavity structure of adamantane, which suggests its potential application as high-performance low-κ material in next-generation microelectronics.

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Title: Novel adamantane-based periodic mesoporous organosilica film with ultralow dielectric constant and high mechanical strength
Authors: Guoping Zhang
Jiawei Zhang
Fangfang Niu
Fan Zhang
Songfang Zhao
Mingliang Wang
Yongju Gao
Rong Sun
Chingping Wong
Publication date: 14-02-2018
Publisher: Springer US
Published in: Journal of Sol-Gel Science and Technology / Issue 3/2018
Print ISSN: 0928-0707
Electronic ISSN: 1573-4846
DOI: https://doi.org/10.1007/s10971-018-4582-5

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