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Microsystem Technologies
Published in: Microsystem Technologies 9-11/2008

01-10-2008 | Technical Paper

Reflectivity test of X-ray mirrors for deep X-ray lithography

Authors: V. Nazmov, E. Reznikova, A. Last, M. Boerner, J. Mohr

Published in: Microsystem Technologies | Issue 9-11/2008

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Abstract

The reflectivity of grazing angle X-ray mirrors, used for X-ray deep lithography, is tested by means of a calorimetric method. A deviation in the reflectivity of a used mirror compared with the reflectivity of a clean surface is observed. This deviation is caused by an oxide layer on the mirrors surfaces. The density, thickness and roughness of the assumed oxide layers are determined experimentally.
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Literature
Anashin VV, Gorbunova NA, Koop IA, Nazmov VP, Osipov VN, Pindyurin VF (1995) SR power calorimetry and photon measurements at the photodesorption beam line of the VEPP-2M storage ring. Nucl Inst Meth Phys Res A359:437CrossRef
Andreeva VV (1964) Behavior and nature of thin oxide films on some metals in gaseous media and in electrolyte solutions. Corrosion 20:35t
Croce P, Nevot L (1980) Caractérisations des surfaces par refléxion rasante de rayons X, application à l’étude du polissage. Rev Phys Appl 15:761
Hattori T, Mekaru H, Utsumi Y (2002) An approach to three-dimensional microstrusture fabrication utilizing hard X-ray lithography of synchrotron radiation. Rev Sci Inst 73:1376CrossRef
Michette A (1986) Optical systems for soft X-rays. Plenum Press, New York
Reznikova E, Nazmov V, Mohr J (2005) Characterization of pre- and post-exposure baking for ultra-deep X-ray lithography with SU-8 resist. In: International conference on HARMST-05 Abstract book
Reznikova E, Boerner M, Jakobs P-J, Nazmov V, Mohr J, Mappes T (2007) Soft X-ray lithography of high aspect ratio SU-8 submicron structures. In: Proceedings of the HARMST-07
Romanato F, Di Fabrizio E, Vaccari L, Altissimo M, Cojoc D, Businaro L, Cabrini S (2001) LILIT beamline for soft and deep X-ray lithography at Elettra. Microelectron Eng 57–58:101CrossRef
Sandberg RL, Allred DD, Johnson JE, Turley RS (2003) A comparison of uranium oxide and nickel as single-layer reflectors from 2.7 to 11.6 nanometers. In: Advances in mirror technology for X-Ray, EUV lithography, laser, and other applications, proceedings of SPIE 5193:191
Yi F, Zhang J, Xie C, Wang D, Chen D (2006) Activities of LIGA and NANO LIGA technologies at BSRF. J Phys Conf Ser 34:865CrossRef
Metadata
Title
Reflectivity test of X-ray mirrors for deep X-ray lithography
Authors
V. Nazmov
E. Reznikova
A. Last
M. Boerner
J. Mohr
Publication date
01-10-2008
Publisher
Springer-Verlag
Published in
Microsystem Technologies / Issue 9-11/2008
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-008-0581-8

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