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Published in: Journal of Materials Science: Materials in Electronics 12/2018

11-04-2018

The effect of PtxPb intermetallic metastable phase on the crystal orientation in PZT thin films

Authors: Mi Xiao, Weikang Zhang, Zebin Zhang, Ping Zhang

Published in: Journal of Materials Science: Materials in Electronics | Issue 12/2018

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Abstract

In this paper, the crystal orientations of Pb(Zr0.52Ti0.48)O3 (PZT) thin films prepared by sol–gel method were investigated by using various initial annealing temperature in the modified annealing process. The films were put directly into the muffle furnace when the temperature reached at 300–500 °C, it’s clear that this modified annealing process made the PZT films presented better (111)-orientation. A PtxPb intermetallic metastable phase was observed by X-ray diffraction, which is considered to be connected with the promotion of the (111) preferred orientation. The PZT thin film with 400 °C initial annealing temperature has the maximum (111) diffraction intensity, remanent polarization and dielectric constant.

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Metadata
Title
The effect of PtxPb intermetallic metastable phase on the crystal orientation in PZT thin films
Authors
Mi Xiao
Weikang Zhang
Zebin Zhang
Ping Zhang
Publication date
11-04-2018
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 12/2018
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-018-9087-z

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