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Published in: Journal of Materials Science: Materials in Electronics 23/2020

19-10-2020 | Review

Ferroelectric photovoltaic effect and resistive switching behavior modulated by ferroelectric/electrode interface coupling

Authors: Lei Huang, Min Wei, Chen Gui, Lijun Jia

Published in: Journal of Materials Science: Materials in Electronics | Issue 23/2020

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Abstract

The anomalous photovoltaic effect and resistive switching behaviors in ferroelectric materials attract much attention in recent years. Dozens of researches revealed that the two effects coexist and affect each other in electrode/ferroelectric/electrode structures. Therefore, the conductive mechanisms and research progresses of the two effects were discussed in this study, which suggested the interface coupling effect caused by polarization states led to switchable photovoltaic and different resistance states. On the other hand, electrode/ferroelectric/electrode structures have great potential in the application of high-density memories, and a novel non-volatile optoelectronic memory which can write multiple storage states and read information non-destructively can be realized by exploiting the two effects properly.

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Literature
1.
go back to reference S.Y. Yang, J. Seidel, S.J. Byrnes, P. Shafer, C.H. Yang, M.D. Rossell, P. Yu, Y.H. Chu, J.F. Scott, J.W. Ager 3rd, L.W. Martin, R. Ramesh, Nat. Nanotechnol. 5, 143–147 (2010) S.Y. Yang, J. Seidel, S.J. Byrnes, P. Shafer, C.H. Yang, M.D. Rossell, P. Yu, Y.H. Chu, J.F. Scott, J.W. Ager 3rd, L.W. Martin, R. Ramesh, Nat. Nanotechnol. 5, 143–147 (2010)
2.
go back to reference T. Choi, S. Lee, Y.J. Choi, V. Kiryukhin, S.W. Cheong, Science 324, 63–66 (2009) T. Choi, S. Lee, Y.J. Choi, V. Kiryukhin, S.W. Cheong, Science 324, 63–66 (2009)
3.
go back to reference Y. Yuan, Z. Xiao, B. Yang, J. Huang, J. Mater. Chem. A 2, 6027–6041 (2014) Y. Yuan, Z. Xiao, B. Yang, J. Huang, J. Mater. Chem. A 2, 6027–6041 (2014)
4.
go back to reference S.Y. Yang, L.W. Martin, S.J. Byrnes, T.E. Conry, S.R. Basu, D. Paran, L. Reichertz, J. Ihlefeld, C. Adamo, A. Melville, Y.H. Chu, C.H. Yang, J.L. Musfeldt, D.G. Schlom, J.W. Ager, R. Ramesh, Appl. Phys. Lett. 95, 3 (2009) S.Y. Yang, L.W. Martin, S.J. Byrnes, T.E. Conry, S.R. Basu, D. Paran, L. Reichertz, J. Ihlefeld, C. Adamo, A. Melville, Y.H. Chu, C.H. Yang, J.L. Musfeldt, D.G. Schlom, J.W. Ager, R. Ramesh, Appl. Phys. Lett. 95, 3 (2009)
5.
go back to reference M. Alexe, Nano Lett. 12, 2193–2198 (2012) M. Alexe, Nano Lett. 12, 2193–2198 (2012)
6.
go back to reference R. Guo, L. You, Y. Zhou, Z. Shiuh Lim, X. Zou, L. Chen, R. Ramesh, J. Wang, Nat. Commun. 4, 1–5 (2013) R. Guo, L. You, Y. Zhou, Z. Shiuh Lim, X. Zou, L. Chen, R. Ramesh, J. Wang, Nat. Commun. 4, 1–5 (2013)
7.
go back to reference H. Abbas, A. Ali, J. Jung, Q.L. Hu, M.R. Park, H.H. Lee, T.S. Yoon, C.J. Kang, Appl. Phys. Lett. 114, 5 (2019) H. Abbas, A. Ali, J. Jung, Q.L. Hu, M.R. Park, H.H. Lee, T.S. Yoon, C.J. Kang, Appl. Phys. Lett. 114, 5 (2019)
8.
go back to reference S. Maji, S. Samanta, P. Das, S. Maikap, V.R. Dhanak, I.Z. Mitrovic, R. Mahapatra, J. Vac. Sci. Technol., B 37, 7 (2019) S. Maji, S. Samanta, P. Das, S. Maikap, V.R. Dhanak, I.Z. Mitrovic, R. Mahapatra, J. Vac. Sci. Technol., B 37, 7 (2019)
9.
go back to reference M.X. Jia, Z.Q. Ren, Y.D. Liu, Y. Cheng, R. Huang, P.H. Xiang, X.D. Tang, B.B. Tian, N. Zhong, C.G. Duan, Appl. Phys. Lett. 114, 5 (2019) M.X. Jia, Z.Q. Ren, Y.D. Liu, Y. Cheng, R. Huang, P.H. Xiang, X.D. Tang, B.B. Tian, N. Zhong, C.G. Duan, Appl. Phys. Lett. 114, 5 (2019)
10.
go back to reference Z. Lu, X. Yang, C. Jin, P. Li, J.G. Wan, J.M. Liu, Adv. Electron. Mater. 4, 6 (2018) Z. Lu, X. Yang, C. Jin, P. Li, J.G. Wan, J.M. Liu, Adv. Electron. Mater. 4, 6 (2018)
11.
go back to reference X.J. Wang, Y.Y. Wang, M. Feng, K.Y. Wang, P.B. Bai, Y.M. Tian, Curr. Appl. Phys. 20, 371–378 (2020) X.J. Wang, Y.Y. Wang, M. Feng, K.Y. Wang, P.B. Bai, Y.M. Tian, Curr. Appl. Phys. 20, 371–378 (2020)
12.
go back to reference C. Paillard, X.F. Bai, I.C. Infante, M. Guennou, G. Geneste, M. Alexe, J. Kreisel, B. Dkhil, Adv. Mater. 28, 5153–5168 (2016) C. Paillard, X.F. Bai, I.C. Infante, M. Guennou, G. Geneste, M. Alexe, J. Kreisel, B. Dkhil, Adv. Mater. 28, 5153–5168 (2016)
13.
go back to reference A. Chanthbouala, A. Crassous, V. Garcia, K. Bouzehouane, S. Fusil, X. Moya, J. Allibe, B. Dlubak, J. Grollier, S. Xavier, C. Deranlot, A. Moshar, R. Proksch, N.D. Mathur, M. Bibes, A. Barthelemy, Nat. Nanotechnol. 7, 101–104 (2012) A. Chanthbouala, A. Crassous, V. Garcia, K. Bouzehouane, S. Fusil, X. Moya, J. Allibe, B. Dlubak, J. Grollier, S. Xavier, C. Deranlot, A. Moshar, R. Proksch, N.D. Mathur, M. Bibes, A. Barthelemy, Nat. Nanotechnol. 7, 101–104 (2012)
14.
go back to reference A. Chanthbouala, V. Garcia, R.O. Cherifi, K. Bouzehouane, S. Fusil, X. Moya, S. Xavier, H. Yamada, C. Deranlot, N.D. Mathur, M. Bibes, A. Barthelemy, J. Grollier, Nat. Mater. 11, 860–864 (2012) A. Chanthbouala, V. Garcia, R.O. Cherifi, K. Bouzehouane, S. Fusil, X. Moya, S. Xavier, H. Yamada, C. Deranlot, N.D. Mathur, M. Bibes, A. Barthelemy, J. Grollier, Nat. Mater. 11, 860–864 (2012)
15.
go back to reference D.J. Kim, H. Lu, S. Ryu, C.W. Bark, C.B. Eom, E.Y. Tsymbal, A. Gruverman, Nano Lett. 12, 5697–5702 (2012) D.J. Kim, H. Lu, S. Ryu, C.W. Bark, C.B. Eom, E.Y. Tsymbal, A. Gruverman, Nano Lett. 12, 5697–5702 (2012)
16.
go back to reference H.J. Song, J.B. Wang, X.L. Zhong, J.J. Cheng, G.K. Zhong, RSC Adv. 4, 50891–50896 (2014) H.J. Song, J.B. Wang, X.L. Zhong, J.J. Cheng, G.K. Zhong, RSC Adv. 4, 50891–50896 (2014)
17.
go back to reference Y. Liu, G. Tan, Z. Chai, L. Lv, Z. Yue, M. Xue, H. Ren, A. Xia, Ceram. Int. 45, 3522–3530 (2019) Y. Liu, G. Tan, Z. Chai, L. Lv, Z. Yue, M. Xue, H. Ren, A. Xia, Ceram. Int. 45, 3522–3530 (2019)
18.
go back to reference Y. Li, X.Y. Sun, C.Y. Xu, J. Cao, Z.Y. Sun, L. Zhen, Nanoscale 10, 23080–23086 (2018) Y. Li, X.Y. Sun, C.Y. Xu, J. Cao, Z.Y. Sun, L. Zhen, Nanoscale 10, 23080–23086 (2018)
19.
go back to reference J.M.B. Silva, J.P.B. Silva, K.C. Sekhar, M. Pereira, M.J.M. Gomes, Appl. Phys. Lett. 113, 5 (2018) J.M.B. Silva, J.P.B. Silva, K.C. Sekhar, M. Pereira, M.J.M. Gomes, Appl. Phys. Lett. 113, 5 (2018)
20.
go back to reference D. Lee, S.H. Baek, T.H. Kim, J.G. Yoon, C.M. Folkman, C.B. Eom, T.W. Noh, Phys. Rev. B 84, 9 (2011) D. Lee, S.H. Baek, T.H. Kim, J.G. Yoon, C.M. Folkman, C.B. Eom, T.W. Noh, Phys. Rev. B 84, 9 (2011)
21.
go back to reference P. Singh, P.K. Rout, M. Singh, R.K. Rakshit, A. Dogra, Thin Solid Films 643, 60–64 (2017) P. Singh, P.K. Rout, M. Singh, R.K. Rakshit, A. Dogra, Thin Solid Films 643, 60–64 (2017)
22.
go back to reference R. Eskandari, X.D. Zhang, L.M. Malkinski, Appl. Phys. Lett. 110, 5 (2017) R. Eskandari, X.D. Zhang, L.M. Malkinski, Appl. Phys. Lett. 110, 5 (2017)
23.
go back to reference M.S. Zhu, H.W. Zheng, J. Zhang, G.L. Yuan, K. Wang, G.T. Yue, F.Z. Li, Y.Q. Chen, M.J. Wu, W.F. Zhang, Appl. Phys. Lett. 111, 4 (2017) M.S. Zhu, H.W. Zheng, J. Zhang, G.L. Yuan, K. Wang, G.T. Yue, F.Z. Li, Y.Q. Chen, M.J. Wu, W.F. Zhang, Appl. Phys. Lett. 111, 4 (2017)
24.
go back to reference S. Jethva, S. Katba, M. Bhatnagar, M. Ranjan, D. Shukla, D.G. Kuberkar, J. Appl. Phys. 125, 10 (2019) S. Jethva, S. Katba, M. Bhatnagar, M. Ranjan, D. Shukla, D.G. Kuberkar, J. Appl. Phys. 125, 10 (2019)
25.
go back to reference V. Mikheev, A. Chouprik, Y. Lebedinskii, S. Zarubin, Y. Matveyev, E. Kondratyuk, M.G. Kozodaev, A.M. Markeev, A. Zenkevich, D. Negrov, ACS Appl. Mater. Interfaces. 11, 32108–32114 (2019) V. Mikheev, A. Chouprik, Y. Lebedinskii, S. Zarubin, Y. Matveyev, E. Kondratyuk, M.G. Kozodaev, A.M. Markeev, A. Zenkevich, D. Negrov, ACS Appl. Mater. Interfaces. 11, 32108–32114 (2019)
26.
go back to reference V. Mikheev, A. Chouprik, Y. Lebedinskii, S. Zarubin, A.M. Markeev, A.V. Zenkevich, D. Negrov, Nanotechnology 31, 8 (2020) V. Mikheev, A. Chouprik, Y. Lebedinskii, S. Zarubin, A.M. Markeev, A.V. Zenkevich, D. Negrov, Nanotechnology 31, 8 (2020)
27.
go back to reference Y. Guo, B. Guo, W. Dong, H. Li, H. Liu, Nanotechnology 24, 275201 (2013) Y. Guo, B. Guo, W. Dong, H. Li, H. Liu, Nanotechnology 24, 275201 (2013)
28.
go back to reference Z.Q. Ren, Y.D. Liu, S.Y. Bao, N. Yang, N. Zhong, X.D. Tang, P.H. Xiang, C.G. Duan, Appl. Phys. Lett. 115, 5 (2019) Z.Q. Ren, Y.D. Liu, S.Y. Bao, N. Yang, N. Zhong, X.D. Tang, P.H. Xiang, C.G. Duan, Appl. Phys. Lett. 115, 5 (2019)
29.
go back to reference W.J. Hu, Z.H. Wang, W.L. Yu, T. Wu, Nat. Commun. 7, 9 (2016) W.J. Hu, Z.H. Wang, W.L. Yu, T. Wu, Nat. Commun. 7, 9 (2016)
30.
go back to reference J. Junquera, P. Ghosez, Nature 422, 506–509 (2003) J. Junquera, P. Ghosez, Nature 422, 506–509 (2003)
31.
go back to reference J.J. Tian, Z.W. Tan, Z. Fan, D.F. Zheng, Y.D. Wang, Z.F. Chen, F. Sun, D.Y. Chen, M.H. Qin, M. Zeng, X.B. Lu, X.S. Gao, J.M. Liu, Phys. Rev. Appl. 11, 15 (2019) J.J. Tian, Z.W. Tan, Z. Fan, D.F. Zheng, Y.D. Wang, Z.F. Chen, F. Sun, D.Y. Chen, M.H. Qin, M. Zeng, X.B. Lu, X.S. Gao, J.M. Liu, Phys. Rev. Appl. 11, 15 (2019)
32.
go back to reference D.J. Kim, J.Y. Jo, Y.S. Kim, Y.J. Chang, J.S. Lee, J.G. Yoon, T.K. Song, T.W. Noh, Phys. Rev. Lett. 95, 4 (2005) D.J. Kim, J.Y. Jo, Y.S. Kim, Y.J. Chang, J.S. Lee, J.G. Yoon, T.K. Song, T.W. Noh, Phys. Rev. Lett. 95, 4 (2005)
33.
go back to reference L. Pintilie, M. Alexe, J. Appl. Phys. 98, 8 (2005) L. Pintilie, M. Alexe, J. Appl. Phys. 98, 8 (2005)
34.
go back to reference L. Pintilie, I. Boerasu, M.J.M. Gomes, T. Zhao, R. Ramesh, M. Alexe, J. Appl. Phys. 98, 9 (2005) L. Pintilie, I. Boerasu, M.J.M. Gomes, T. Zhao, R. Ramesh, M. Alexe, J. Appl. Phys. 98, 9 (2005)
35.
go back to reference W.C. Zheng, Y.C. Wang, C. Jin, R.H. Yin, D. Li, P. Wang, S.S. Liu, X.Y. Wang, D.X. Zheng, H.L. Bai, Phys. Chem. Chem. Phys. 22, 13277–13284 (2020) W.C. Zheng, Y.C. Wang, C. Jin, R.H. Yin, D. Li, P. Wang, S.S. Liu, X.Y. Wang, D.X. Zheng, H.L. Bai, Phys. Chem. Chem. Phys. 22, 13277–13284 (2020)
36.
go back to reference Y. Zhou, C. Wang, S. Tian, X. Yao, C. Ge, E.-J. Guo, M. He, G. Yang, K. Jin, Thin Solid Films 698, 137851 (2020) Y. Zhou, C. Wang, S. Tian, X. Yao, C. Ge, E.-J. Guo, M. He, G. Yang, K. Jin, Thin Solid Films 698, 137851 (2020)
37.
go back to reference D.B. Strukov, G.S. Snider, D.R. Stewart, R.S. Williams, Nature 453, 80–83 (2008) D.B. Strukov, G.S. Snider, D.R. Stewart, R.S. Williams, Nature 453, 80–83 (2008)
38.
go back to reference Z. Fan, H. Fan, Z.X. Lu, P.L. Li, Z.F. Huang, G. Tian, L. Yang, J.X. Yao, C. Chen, D.Y. Chen, Z.B. Yan, X.B. Lu, X.S. Gao, J.M. Liu, Phys. Rev. Appl. 7, 11 (2017) Z. Fan, H. Fan, Z.X. Lu, P.L. Li, Z.F. Huang, G. Tian, L. Yang, J.X. Yao, C. Chen, D.Y. Chen, Z.B. Yan, X.B. Lu, X.S. Gao, J.M. Liu, Phys. Rev. Appl. 7, 11 (2017)
39.
go back to reference V.Q. Le, T.H. Do, J.R.D. Retamal, P.W. Shao, Y.H. Lai, W.W. Wu, J.H. He, Y.L. Chueh, Y.H. Chu, Nano Energy 56, 322–329 (2019) V.Q. Le, T.H. Do, J.R.D. Retamal, P.W. Shao, Y.H. Lai, W.W. Wu, J.H. He, Y.L. Chueh, Y.H. Chu, Nano Energy 56, 322–329 (2019)
40.
go back to reference J.Y. Chen, C.L. Hsin, C.W. Huang, C.H. Chiu, Y.T. Huang, S.J. Lin, W.W. Wu, L.J. Chen, Nano Lett. 13, 3671–3677 (2013) J.Y. Chen, C.L. Hsin, C.W. Huang, C.H. Chiu, Y.T. Huang, S.J. Lin, W.W. Wu, L.J. Chen, Nano Lett. 13, 3671–3677 (2013)
41.
go back to reference J.Y. Son, Y.H. Shin, Appl. Phys. Lett. 92, 3 (2008) J.Y. Son, Y.H. Shin, Appl. Phys. Lett. 92, 3 (2008)
42.
go back to reference U. Celano, L. Goux, A. Belmonte, K. Opsomer, A. Franquet, A. Schulze, C. Detavernier, O. Richard, H. Bender, M. Jurczak, W. Vandervorst, Nano Lett. 14, 2401–2406 (2014) U. Celano, L. Goux, A. Belmonte, K. Opsomer, A. Franquet, A. Schulze, C. Detavernier, O. Richard, H. Bender, M. Jurczak, W. Vandervorst, Nano Lett. 14, 2401–2406 (2014)
43.
go back to reference H. Liu, M. Wei, Y.Z. Chen, Nanotechnol. Rev. 7, 443–468 (2018) H. Liu, M. Wei, Y.Z. Chen, Nanotechnol. Rev. 7, 443–468 (2018)
44.
go back to reference Z. Xi, C. Zheng, Z. Wen, A.C.S. Appl, Mater. Interfaces 10, 6024–6030 (2018) Z. Xi, C. Zheng, Z. Wen, A.C.S. Appl, Mater. Interfaces 10, 6024–6030 (2018)
45.
go back to reference Y.-C. Li, J. Wu, H.-Y. Pan, J. Wang, G.-H. Wang, J.-M. Liu, J.-G. Wan, Appl. Phys. Lett. 112, 212902 (2018) Y.-C. Li, J. Wu, H.-Y. Pan, J. Wang, G.-H. Wang, J.-M. Liu, J.-G. Wan, Appl. Phys. Lett. 112, 212902 (2018)
46.
go back to reference Y. Bai, Z.J. Wang, Y.N. Chen, J.Z. Cui, ACS Appl. Mater. Interfaces. 8, 32948–32955 (2016) Y. Bai, Z.J. Wang, Y.N. Chen, J.Z. Cui, ACS Appl. Mater. Interfaces. 8, 32948–32955 (2016)
47.
go back to reference T. Wang, L.L. Cheng, C.X. Wang, W.M. Cheng, H.W. Wang, H.J. Sun, J.C. Chen, X.S. Miao, IEEE Trans. Magn. 56, 4 (2020) T. Wang, L.L. Cheng, C.X. Wang, W.M. Cheng, H.W. Wang, H.J. Sun, J.C. Chen, X.S. Miao, IEEE Trans. Magn. 56, 4 (2020)
48.
go back to reference R. Gao, W. Cai, G. Chen, X. Deng, X. Cao, C. Fu, Mater. Res. Bull. 84, 93–98 (2016) R. Gao, W. Cai, G. Chen, X. Deng, X. Cao, C. Fu, Mater. Res. Bull. 84, 93–98 (2016)
49.
go back to reference Z. Hu, Q. Li, M. Li, Q. Wang, Y. Zhu, X. Liu, X. Zhao, Y. Liu, S. Dong, Appl. Phys. Lett. 102, 102901 (2013) Z. Hu, Q. Li, M. Li, Q. Wang, Y. Zhu, X. Liu, X. Zhao, Y. Liu, S. Dong, Appl. Phys. Lett. 102, 102901 (2013)
50.
go back to reference M. Li, J. Zhou, X.S. Jing, M. Zeng, S.J. Wu, J.W. Gao, Z. Zhang, X.S. Gao, X.B. Lu, J.M. Liu, M. Alexe, Adv. Electron. Mater. 1, 8 (2015) M. Li, J. Zhou, X.S. Jing, M. Zeng, S.J. Wu, J.W. Gao, Z. Zhang, X.S. Gao, X.B. Lu, J.M. Liu, M. Alexe, Adv. Electron. Mater. 1, 8 (2015)
51.
go back to reference D. Li, D. Zheng, C. Jin, W. Zheng, H. Bai, A.C.S. Appl, Mater. Interfaces 10, 19836–19843 (2018) D. Li, D. Zheng, C. Jin, W. Zheng, H. Bai, A.C.S. Appl, Mater. Interfaces 10, 19836–19843 (2018)
52.
go back to reference H. Xu, X. Zhai, Z. Wang, Z. Cui, Z. Fu, Y. Lu, Appl. Phys. Lett. 114, 102904 (2019) H. Xu, X. Zhai, Z. Wang, Z. Cui, Z. Fu, Y. Lu, Appl. Phys. Lett. 114, 102904 (2019)
53.
go back to reference J.H. Lee, J.H. Jeon, C. Yoon, S. Lee, Y.S. Kim, T.J. Oh, Y.H. Kim, J. Park, T.K. Song, B.H. Park, Appl. Phys. Lett. 108, 5 (2016) J.H. Lee, J.H. Jeon, C. Yoon, S. Lee, Y.S. Kim, T.J. Oh, Y.H. Kim, J. Park, T.K. Song, B.H. Park, Appl. Phys. Lett. 108, 5 (2016)
54.
go back to reference P. Li, Z. Huang, Z. Fan, H. Fan, Q. Luo, C. Chen, D. Chen, M. Zeng, M. Qin, Z. Zhang, X. Lu, X. Gao, J.M. Liu, ACS Appl. Mater. Interfaces. 9, 27120–27126 (2017) P. Li, Z. Huang, Z. Fan, H. Fan, Q. Luo, C. Chen, D. Chen, M. Zeng, M. Qin, Z. Zhang, X. Lu, X. Gao, J.M. Liu, ACS Appl. Mater. Interfaces. 9, 27120–27126 (2017)
55.
go back to reference N. Yang, C.Z. Hu, Z.Q. Ren, S.Y. Bao, B.B. Tian, F.Y. Yue, P.H. Xiang, N. Zhong, C.G. Duan, J.H. Chu, ACS Appl. Electron. Mater. 2, 1035–1040 (2020) N. Yang, C.Z. Hu, Z.Q. Ren, S.Y. Bao, B.B. Tian, F.Y. Yue, P.H. Xiang, N. Zhong, C.G. Duan, J.H. Chu, ACS Appl. Electron. Mater. 2, 1035–1040 (2020)
56.
go back to reference W.J. Hu, L. Hu, R.H. Wei, X.W. Tang, W.H. Song, J.M. Dai, X.B. Zhu, Y.P. Sun, Chin. Phys. Lett. 35, 047301 (2018) W.J. Hu, L. Hu, R.H. Wei, X.W. Tang, W.H. Song, J.M. Dai, X.B. Zhu, Y.P. Sun, Chin. Phys. Lett. 35, 047301 (2018)
57.
go back to reference P.F. Hou, J.B. Wang, X.L. Zhong, Y.X. Wu, RSC Adv. 6, 54113–54118 (2016) P.F. Hou, J.B. Wang, X.L. Zhong, Y.X. Wu, RSC Adv. 6, 54113–54118 (2016)
58.
go back to reference Z.L. Miao, W. Wang, R.C. Yuan, J. Zhu, S.D. Wu, H.T. Chen, X.H. Zeng, Q. Wang, NANO 13, 8 (2018) Z.L. Miao, W. Wang, R.C. Yuan, J. Zhu, S.D. Wu, H.T. Chen, X.H. Zeng, Q. Wang, NANO 13, 8 (2018)
59.
go back to reference Y. Liu, Y.J. Qi, P. Zhou, C.X. Guan, H. Chen, J.Z. Wang, Z.J. Ma, T.J. Zhang, Y. Liu, J. Phys. D-Appl. Phys. 51, 6 (2018) Y. Liu, Y.J. Qi, P. Zhou, C.X. Guan, H. Chen, J.Z. Wang, Z.J. Ma, T.J. Zhang, Y. Liu, J. Phys. D-Appl. Phys. 51, 6 (2018)
60.
go back to reference Y.D. Zhu, M.Y. Li, Z.Q. Hu, X.L. Liu, Q.W. Wang, X.L. Fang, K.M. Guo, J. Phys. D-Appl. Phys. 46, 5 (2013) Y.D. Zhu, M.Y. Li, Z.Q. Hu, X.L. Liu, Q.W. Wang, X.L. Fang, K.M. Guo, J. Phys. D-Appl. Phys. 46, 5 (2013)
61.
go back to reference R.Q. Chen, M.M. Lao, J. Xu, C.D. Xu, Appl. Phys. Express 7, 4 (2014) R.Q. Chen, M.M. Lao, J. Xu, C.D. Xu, Appl. Phys. Express 7, 4 (2014)
62.
go back to reference B.W. Dong, J. Miao, J.Z. Han, F. Shao, J. Yuan, K.K. Meng, Y. Wu, X.G. Xu, Y. Jiang, Appl. Surf. Sci. 434, 687–692 (2018) B.W. Dong, J. Miao, J.Z. Han, F. Shao, J. Yuan, K.K. Meng, Y. Wu, X.G. Xu, Y. Jiang, Appl. Surf. Sci. 434, 687–692 (2018)
63.
go back to reference J.P.B. Silva, K. Kamakshi, K.C. Sekhar, E.C. Queirós, J. Agostinho Moreira, A. Almeida, M. Pereira, P.B. Tavares, M.J.M. Gomes, J. Phys. D Appl. Phys. 49, 335301 (2016) J.P.B. Silva, K. Kamakshi, K.C. Sekhar, E.C. Queirós, J. Agostinho Moreira, A. Almeida, M. Pereira, P.B. Tavares, M.J.M. Gomes, J. Phys. D Appl. Phys. 49, 335301 (2016)
64.
go back to reference Z. Wang, D. Zheng, D. Li, C. Jin, H. Bai, Thin Solid Films 671, 59–63 (2019) Z. Wang, D. Zheng, D. Li, C. Jin, H. Bai, Thin Solid Films 671, 59–63 (2019)
65.
go back to reference A. Cardona Rodríguez, I.C. Arango, M.F. Gomez, C. Dominguez, J. Trastoy, C. Urban, S. Sulekar, J.C. Nino, I.K. Schuller, M.E. Gomez, J.G. Ramírez, Solid State Commun. 288, 38–42 (2019) A. Cardona Rodríguez, I.C. Arango, M.F. Gomez, C. Dominguez, J. Trastoy, C. Urban, S. Sulekar, J.C. Nino, I.K. Schuller, M.E. Gomez, J.G. Ramírez, Solid State Commun. 288, 38–42 (2019)
66.
go back to reference X.S. Huang, Z.M. Gao, P. Li, L.F. Wang, X.S. Liu, W.F. Zhang, H.Z. Guo, J. Appl. Phys. 123, 5 (2018) X.S. Huang, Z.M. Gao, P. Li, L.F. Wang, X.S. Liu, W.F. Zhang, H.Z. Guo, J. Appl. Phys. 123, 5 (2018)
67.
go back to reference Y. Wang, W.J. Chen, X.Y. Zhang, W.J. Ma, B. Wang, Y. Zheng, Acta. Mech. Sin. 30, 526–532 (2014) Y. Wang, W.J. Chen, X.Y. Zhang, W.J. Ma, B. Wang, Y. Zheng, Acta. Mech. Sin. 30, 526–532 (2014)
68.
go back to reference H. Fan, C. Chen, Z. Fan, L.Y. Zhang, Z.W. Tan, P.L. Li, Z.F. Huang, J.X. Yao, G. Tian, Q.Y. Luo, Z.W. Li, X. Song, D.Y. Chen, M. Zeng, J.W. Gao, X.B. Lu, Y. Zhao, X.S. Gao, J.M. Liu, Appl. Phys. Lett. 111, 5 (2017) H. Fan, C. Chen, Z. Fan, L.Y. Zhang, Z.W. Tan, P.L. Li, Z.F. Huang, J.X. Yao, G. Tian, Q.Y. Luo, Z.W. Li, X. Song, D.Y. Chen, M. Zeng, J.W. Gao, X.B. Lu, Y. Zhao, X.S. Gao, J.M. Liu, Appl. Phys. Lett. 111, 5 (2017)
69.
go back to reference D. Wu, T. Xu, Z. Shi, Y. Tian, X. Li, Y. Yu, Y. Jiang, J. Alloys Compd. 695, 1653–1657 (2017) D. Wu, T. Xu, Z. Shi, Y. Tian, X. Li, Y. Yu, Y. Jiang, J. Alloys Compd. 695, 1653–1657 (2017)
70.
go back to reference X.G. Chen, X.B. Ma, Y.B. Yang, L.P. Chen, G.C. Xiong, G.J. Lian, Y.C. Yang, J.B. Yang, Appl. Phys. Lett. 98, 122102 (2011) X.G. Chen, X.B. Ma, Y.B. Yang, L.P. Chen, G.C. Xiong, G.J. Lian, Y.C. Yang, J.B. Yang, Appl. Phys. Lett. 98, 122102 (2011)
71.
go back to reference X.B. Yan, Y.D. Xia, H.N. Xu, X. Gao, H.T. Li, R. Li, J. Yin, Z.G. Liu, Appl. Phys. Lett. 97, 112101 (2010) X.B. Yan, Y.D. Xia, H.N. Xu, X. Gao, H.T. Li, R. Li, J. Yin, Z.G. Liu, Appl. Phys. Lett. 97, 112101 (2010)
72.
go back to reference X. Zou, H.G. Ong, L. You, W. Chen, H. Ding, H. Funakubo, L. Chen, J. Wang, AIP Adv. 2, 032166 (2012) X. Zou, H.G. Ong, L. You, W. Chen, H. Ding, H. Funakubo, L. Chen, J. Wang, AIP Adv. 2, 032166 (2012)
73.
go back to reference Y.D. Liu, C.Z. Hu, J.J. Wang, N. Zhong, P.H. Xiang, C.G. Duan, J. Mater. Chem. C 8, 5815–5820 (2020) Y.D. Liu, C.Z. Hu, J.J. Wang, N. Zhong, P.H. Xiang, C.G. Duan, J. Mater. Chem. C 8, 5815–5820 (2020)
74.
go back to reference H. Han, D. Kim, S. Chae, J. Park, S.Y. Nam, M. Choi, K. Yong, H.J. Kim, J. Son, H.M. Jang, Nanoscale 10, 13261–13269 (2018) H. Han, D. Kim, S. Chae, J. Park, S.Y. Nam, M. Choi, K. Yong, H.J. Kim, J. Son, H.M. Jang, Nanoscale 10, 13261–13269 (2018)
75.
go back to reference M. Qin, K. Yao, Y.C. Liang, Appl. Phys. Lett. 93, 122904 (2008) M. Qin, K. Yao, Y.C. Liang, Appl. Phys. Lett. 93, 122904 (2008)
76.
go back to reference M. Qin, K. Yao, Y.C. Liang, B.K. Gan, Appl. Phys. Lett. 91, 3 (2007) M. Qin, K. Yao, Y.C. Liang, B.K. Gan, Appl. Phys. Lett. 91, 3 (2007)
77.
go back to reference R. Nechache, C. Harnagea, S. Li, L. Cardenas, W. Huang, J. Chakrabartty, F. Rosei, Nat. Photon. 9, 61–67 (2015) R. Nechache, C. Harnagea, S. Li, L. Cardenas, W. Huang, J. Chakrabartty, F. Rosei, Nat. Photon. 9, 61–67 (2015)
78.
go back to reference S. Pal, A.B. Swain, P.P. Biswas, D. Murali, A. Pal, B.R.K. Nanda, P. Murugavel, Sci. Rep. 8, 7 (2018) S. Pal, A.B. Swain, P.P. Biswas, D. Murali, A. Pal, B.R.K. Nanda, P. Murugavel, Sci. Rep. 8, 7 (2018)
79.
go back to reference F. Zheng, Y. Xin, W. Huang, J. Zhang, X. Wang, M. Shen, W. Dong, L. Fang, Y. Bai, X. Shen, J. Hao, J. Mater. Chem. A 2, 1363–1368 (2014) F. Zheng, Y. Xin, W. Huang, J. Zhang, X. Wang, M. Shen, W. Dong, L. Fang, Y. Bai, X. Shen, J. Hao, J. Mater. Chem. A 2, 1363–1368 (2014)
80.
go back to reference X.L. Yang, X.D. Su, M.R. Shen, F.G. Zheng, Y. Xin, L. Zhang, M.C. Hua, Y.J. Chen, V.G. Harris, Adv. Mater. 24, 1202–1208 (2012) X.L. Yang, X.D. Su, M.R. Shen, F.G. Zheng, Y. Xin, L. Zhang, M.C. Hua, Y.J. Chen, V.G. Harris, Adv. Mater. 24, 1202–1208 (2012)
81.
go back to reference R. Gupta, V. Gupta, M. Tomar, Mater. Sci. Semicond. Process. 105, 104723 (2020) R. Gupta, V. Gupta, M. Tomar, Mater. Sci. Semicond. Process. 105, 104723 (2020)
82.
go back to reference M. Wei, M. Liu, L. Yang, B. Xie, X. Li, X. Wang, X. Cheng, Y. Zhu, Z. Li, Y. Su, M. Li, Z. Hu, J.-M. Liu, Ceram. Int. 46, 5126–5131 (2020) M. Wei, M. Liu, L. Yang, B. Xie, X. Li, X. Wang, X. Cheng, Y. Zhu, Z. Li, Y. Su, M. Li, Z. Hu, J.-M. Liu, Ceram. Int. 46, 5126–5131 (2020)
83.
go back to reference Z.F. Chen, Y.D. Wang, D.F. Zheng, F. Sun, X. Deng, Z.W. Tan, J.J. Tian, L.Y. Zhang, M. Zeng, Z. Fan, D.Y. Chen, Z.P. Hou, X.S. Gao, Q.L. Li, J.M. Liu, J. Alloys Compd. 811, 6 (2019) Z.F. Chen, Y.D. Wang, D.F. Zheng, F. Sun, X. Deng, Z.W. Tan, J.J. Tian, L.Y. Zhang, M. Zeng, Z. Fan, D.Y. Chen, Z.P. Hou, X.S. Gao, Q.L. Li, J.M. Liu, J. Alloys Compd. 811, 6 (2019)
84.
go back to reference J. Chakrabartty, C. Harnagea, M. Celikin, F. Rosei, R. Nechache, Nat. Photon. 12, 271–276 (2018) J. Chakrabartty, C. Harnagea, M. Celikin, F. Rosei, R. Nechache, Nat. Photon. 12, 271–276 (2018)
85.
go back to reference K. Mistewicz, M. Nowak, D. Stróż, Nanomaterials 9, 580 (2019) K. Mistewicz, M. Nowak, D. Stróż, Nanomaterials 9, 580 (2019)
86.
go back to reference R. Moubah, O. Rousseau, D. Colson, A. Artemenko, M. Maglione, M. Viret, Adv. Funct. Mater. 22, 4814–4818 (2012) R. Moubah, O. Rousseau, D. Colson, A. Artemenko, M. Maglione, M. Viret, Adv. Funct. Mater. 22, 4814–4818 (2012)
87.
go back to reference A. Bhatnagar, A.R. Chaudhuri, Y.H. Kim, D. Hesse, M. Alexe, Nat. Commun. 4, 8 (2013) A. Bhatnagar, A.R. Chaudhuri, Y.H. Kim, D. Hesse, M. Alexe, Nat. Commun. 4, 8 (2013)
88.
go back to reference P.P. Biswas, T. Chinthakuntla, D. Duraisamy, G. Nambi Venkatesan, S. Venkatachalam, P. Murugavel, Appl. Phys. Lett. 110, 192906 (2017) P.P. Biswas, T. Chinthakuntla, D. Duraisamy, G. Nambi Venkatesan, S. Venkatachalam, P. Murugavel, Appl. Phys. Lett. 110, 192906 (2017)
89.
go back to reference H. Gao, Y. Yang, Y. Wang, L. Chen, J. Wang, G. Yuan, J.M. Liu, ACS Appl. Mater. Interfaces. 11, 35169–35176 (2019) H. Gao, Y. Yang, Y. Wang, L. Chen, J. Wang, G. Yuan, J.M. Liu, ACS Appl. Mater. Interfaces. 11, 35169–35176 (2019)
90.
go back to reference A.B. Swain, M. Rath, P.P. Biswas, M.S.R. Rao, P. Murugavel, APL Mater. 7, 7 (2019) A.B. Swain, M. Rath, P.P. Biswas, M.S.R. Rao, P. Murugavel, APL Mater. 7, 7 (2019)
91.
go back to reference G. Chen, K.L. Zou, Y.X. Yu, Y. Zhang, Q.F. Zhang, Y.M. Lu, Y.B. He, Ceram. Int. 46, 4148–4153 (2020) G. Chen, K.L. Zou, Y.X. Yu, Y. Zhang, Q.F. Zhang, Y.M. Lu, Y.B. He, Ceram. Int. 46, 4148–4153 (2020)
92.
go back to reference C.-S. Tu, P.-Y. Chen, Y.-S. Jou, C.-S. Chen, R.R. Chien, V.H. Schmidt, S.-C. Haw, Acta Mater. 176, 1–10 (2019) C.-S. Tu, P.-Y. Chen, Y.-S. Jou, C.-S. Chen, R.R. Chien, V.H. Schmidt, S.-C. Haw, Acta Mater. 176, 1–10 (2019)
93.
go back to reference S. Wang, L. Li, W. Weng, C. Ji, X. Liu, Z. Sun, W. Lin, M. Hong, J. Luo, J. Am. Chem. Soc. 142, 55–59 (2020) S. Wang, L. Li, W. Weng, C. Ji, X. Liu, Z. Sun, W. Lin, M. Hong, J. Luo, J. Am. Chem. Soc. 142, 55–59 (2020)
94.
go back to reference Z. Lu, P. Li, J.G. Wan, Z. Huang, G. Tian, D. Pan, Z. Fan, X. Gao, J.M. Liu, ACS Appl. Mater. Interfaces. 9, 27284–27289 (2017) Z. Lu, P. Li, J.G. Wan, Z. Huang, G. Tian, D. Pan, Z. Fan, X. Gao, J.M. Liu, ACS Appl. Mater. Interfaces. 9, 27284–27289 (2017)
95.
go back to reference S.-J. Chang, S.-Y. Chen, P.-W. Chen, S.-J. Huang, Y.-C. Tseng, ACS Appl. Mater. Interfaces. 11, 33803–33810 (2019) S.-J. Chang, S.-Y. Chen, P.-W. Chen, S.-J. Huang, Y.-C. Tseng, ACS Appl. Mater. Interfaces. 11, 33803–33810 (2019)
96.
go back to reference B. Chen, M. Li, Y.W. Liu, Z.H. Zuo, F. Zhuge, Q.F. Zhan, R.W. Li, Nanotechnology 22, 5 (2011) B. Chen, M. Li, Y.W. Liu, Z.H. Zuo, F. Zhuge, Q.F. Zhan, R.W. Li, Nanotechnology 22, 5 (2011)
97.
go back to reference D. Cao, C. Wang, F. Zheng, W. Dong, L. Fang, M. Shen, Nano Lett. 12, 2803–2809 (2012) D. Cao, C. Wang, F. Zheng, W. Dong, L. Fang, M. Shen, Nano Lett. 12, 2803–2809 (2012)
98.
go back to reference R. Gao, C. Fu, W. Cai, G. Chen, X. Deng, X. Cao, J. Electron. Mater. 46, 2373–2378 (2017) R. Gao, C. Fu, W. Cai, G. Chen, X. Deng, X. Cao, J. Electron. Mater. 46, 2373–2378 (2017)
99.
go back to reference S.P. Koiry, P. Jha, V. Putta, V. Saxena, A.K. Chauhan, D.K. Aswal, S.K. Gupta, Org. Electron. 25, 143–150 (2015) S.P. Koiry, P. Jha, V. Putta, V. Saxena, A.K. Chauhan, D.K. Aswal, S.K. Gupta, Org. Electron. 25, 143–150 (2015)
100.
go back to reference C. Ge, K.J. Jin, Q.H. Zhang, J.Y. Du, L. Gu, H.Z. Guo, J.T. Yang, J.X. Gu, M. He, J. Xing, C. Wang, H.B. Lu, G.Z. Yang, ACS Appl. Mater. Interfaces. 8, 34590–34597 (2016) C. Ge, K.J. Jin, Q.H. Zhang, J.Y. Du, L. Gu, H.Z. Guo, J.T. Yang, J.X. Gu, M. He, J. Xing, C. Wang, H.B. Lu, G.Z. Yang, ACS Appl. Mater. Interfaces. 8, 34590–34597 (2016)
101.
go back to reference Y.H. Wang, L.Y. Wu, G.D. Liu, L.X. Liu, J. Alloys Compd. 740, 273–277 (2018) Y.H. Wang, L.Y. Wu, G.D. Liu, L.X. Liu, J. Alloys Compd. 740, 273–277 (2018)
102.
go back to reference D.F. Pan, G.F. Bi, G.Y. Chen, H. Zhang, J.M. Liu, G.H. Wang, J.G. Wan, Sci. Rep. 6, 9 (2016) D.F. Pan, G.F. Bi, G.Y. Chen, H. Zhang, J.M. Liu, G.H. Wang, J.G. Wan, Sci. Rep. 6, 9 (2016)
103.
go back to reference B. Guzelturk, A.B. Mei, L. Zhang, L.Z. Tan, P. Donahue, A.G. Singh, D.G. Schlom, L.W. Martin, A.M. Lindenberg, Nano Lett. 20, 145–151 (2020) B. Guzelturk, A.B. Mei, L. Zhang, L.Z. Tan, P. Donahue, A.G. Singh, D.G. Schlom, L.W. Martin, A.M. Lindenberg, Nano Lett. 20, 145–151 (2020)
104.
go back to reference H. Matsuo, Y. Noguchi, M. Miyayama, T. Kiguchi, T.J. Konno, Appl. Phys. Lett. 116, 132901 (2020) H. Matsuo, Y. Noguchi, M. Miyayama, T. Kiguchi, T.J. Konno, Appl. Phys. Lett. 116, 132901 (2020)
105.
go back to reference J.J. Zhao, J.S. Zhang, F. Zhang, W. Wang, H.R. He, W.Y. Cai, J. Wang, Chin. Phys. B 28, 6 (2019) J.J. Zhao, J.S. Zhang, F. Zhang, W. Wang, H.R. He, W.Y. Cai, J. Wang, Chin. Phys. B 28, 6 (2019)
106.
go back to reference S. Xie, L. Pei, M.Y. Li, Y.D. Zhu, X.Y. Cheng, H.Q. Ding, R. Xiong, J. Alloys Compd. 778, 141–147 (2019) S. Xie, L. Pei, M.Y. Li, Y.D. Zhu, X.Y. Cheng, H.Q. Ding, R. Xiong, J. Alloys Compd. 778, 141–147 (2019)
107.
go back to reference B. Sun, M. Tang, J. Gao, C.M. Li, ChemElectroChem 3, 896–901 (2016) B. Sun, M. Tang, J. Gao, C.M. Li, ChemElectroChem 3, 896–901 (2016)
Metadata
Title
Ferroelectric photovoltaic effect and resistive switching behavior modulated by ferroelectric/electrode interface coupling
Authors
Lei Huang
Min Wei
Chen Gui
Lijun Jia
Publication date
19-10-2020
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 23/2020
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-020-04600-3

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