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Microsystem Technologies
Published in: Microsystem Technologies 9-11/2008

01-10-2008 | Technical Paper

Ni electroplating on a resist micro-machined by proton beam writing

Authors: Naoyuki Uchiya, Yusuke Furuta, Hiroyuki Nishikawa, Tohru Watanabe, Junji Haga, Takahiro Satoh, Masakazu Oikawa, Yasuyuki Ishii, Tomihiro Kamiya

Published in: Microsystem Technologies | Issue 9-11/2008

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Abstract

In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.
previous article Thermal stability of electrodeposited LIGA Ni–W alloys for high temperature MEMS applications
next article High aspect ratio glass structures produced by means of the drawing technology

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Metadata
Title
Ni electroplating on a resist micro-machined by proton beam writing
Authors
Naoyuki Uchiya
Yusuke Furuta
Hiroyuki Nishikawa
Tohru Watanabe
Junji Haga
Takahiro Satoh
Masakazu Oikawa
Yasuyuki Ishii
Tomihiro Kamiya
Publication date
01-10-2008
Publisher
Springer-Verlag
Published in
Microsystem Technologies / Issue 9-11/2008
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-007-0549-0

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Editorial

Special issue of the high-aspect-ratio micro-structure technology workshop, HARMST’07, Besançon, France, 7–9 June 2007