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Microsystem Technologies
Published in: Microsystem Technologies 9-11/2008

01-10-2008 | Erratum

Sidewall slopes and roughness of SU-8 HARMST

Authors: K. D. Vora, B.-Y. Shew, B. Lochel, E. C. Harvey, J. P. Hayes, A. G. Peele

Published in: Microsystem Technologies | Issue 9-11/2008

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Excerpt

There is an error in the caption to Fig. 8 and the accompanying text. The reference to a 4 μm opening should be read as 50 μm. Also in the caption to Fig. 8 the statement that “Diffraction at top of the resist is neglected as the mask and resist were in hard contact.” should be ignored as diffraction was in fact included in the calculation. …
previous article Design and manufacturing of micro milling tools

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Metadata
Title
Sidewall slopes and roughness of SU-8 HARMST
Authors
K. D. Vora
B.-Y. Shew
B. Lochel
E. C. Harvey
J. P. Hayes
A. G. Peele
Publication date
01-10-2008
Publisher
Springer-Verlag
Published in
Microsystem Technologies / Issue 9-11/2008
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-008-0634-z

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