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Erschienen in:
2016 | OriginalPaper | Buchkapitel
A Statistical Optimization of Co/Pd Multilayers Patterned via Block Copolymer Lithography
verfasst von : Allen G. Owen, Hao Su, Angelique Montgomery, Robert Douglas, Subhadra Gupta
Erschienen in: TMS 2015 144th Annual Meeting & Exhibition
Verlag: Springer International Publishing
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A statistical Design of Experiments was carried out on the nanopatterning of Co/Pd multilayers using block copolymer templating and ion milling. The multilayers were patterned into welldefined 30 nm nanopillars. The effect of varying ion mill beam power and etch angle on the coercivity of the resulting nanopillars was studied by response surface methodology. The results indicated that an etch angle of between 50° and 60° was optimal for yielding coercivity greater than 3.5 kOe, starting with a full-film coercivity of 1.5 kOe. A further study of coercivity versus etching time was conducted, resulting in a maximum coercivity of 6.6 kOe. Vacuum annealing of the ion-milled nanopillars were found to yield a significant increase in coercivity, indicating reversal of ion irradiation damage.