Cu nanodome-layer film for enhanced optical and electrical performance of metal-grid transparent electrode

Metal grid transparent electrodes, as a key component in a variety of optoelectronic devices, are studied to maintain high electrical conductivity of electrode materials and enhanced light transmittance. In this work, Cu grid transparent electrode was successfully constructed by Cu nanodome-layer thin films. The Cu nanodome-layer thin film with a thickness of 1.32 μm was fabricated using facile and low-cost magnetron sputtering method. Because of the large thickness and long distance between two neighboring lines of the Cu grid transparent electrode, an enhanced sheet resistance of 14 Ω/□ was obtained, and the transmittance was broadened in the wavelength ranging from 318 to 900 nm. These results demonstrated that the method of tuning structure of materials will greatly enhance the efficiency and yield of micro-machining technology, which provides valuable information for the construction of various devices and domains.