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Journal of Nanoparticle Research
Erschienen in: Journal of Nanoparticle Research 1/2011

01.01.2011 | Research Paper

General approach for fabricating nanoparticle arrays via patterned block copolymer nanoreactors

verfasst von: Xihong Zu, Weiping Tu, Yulin Deng

Erschienen in: Journal of Nanoparticle Research | Ausgabe 1/2011

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Abstract

A general approach to fabricate nanoparticle arrays of different kinds of materials is demonstrated in this paper. It was found that the center-to-center distance of the nanoparticles or the nanoclusters can be controlled using patterned block copolymer nanoreactors by adding polystyrene (PS) homopolymer to poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) diblock copolymer thin film. The number of the nanoparticles formed in the P4VP nanodomains can also be adjusted by addition of polystyrene (PS) homopolymer to poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) diblock copolymer. In fabrication of Au nanoparticle arrays, HAuCl4 precursor was directly loaded into P4VP nanodomains of the diblock copolymer thin film by using a methanol solvent, which is a good solvent for P4VP but non-solvent for PS. The Au nanoparticle arrays were then obtained by reducing HAuCl4 with sodium citrate dihydrate, and then in situ transferred to silicon substrate by a two-step calcination method. ZnO and Fe x O y nanoparticle arrays were also synthesized by this approach with thermal decomposition and double decomposition reactions, respectively. Additionally, the advantage of using two-step calcination method over the air plasma method was discussed.
Nächster Artikel Multicomponent periodic nanoparticle superlattices

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Metadaten
Titel
General approach for fabricating nanoparticle arrays via patterned block copolymer nanoreactors
verfasst von
Xihong Zu
Weiping Tu
Yulin Deng
Publikationsdatum
01.01.2011
Verlag
Springer Netherlands
Erschienen in
Journal of Nanoparticle Research / Ausgabe 1/2011
Print ISSN: 1388-0764
Elektronische ISSN: 1572-896X
DOI
https://doi.org/10.1007/s11051-010-0059-3

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