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2005 | Buch

Handbook of Ellipsometry

herausgegeben von: Harland G. Tompkins, Eugene A. Irene

Verlag: Springer Berlin Heidelberg

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Über dieses Buch

Ever progressive miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research are propelling ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, to greater popularity in a widening array of applications. Ellipsometry, without contact and non-damaging to samples, is an ideal measurement technique to determine optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications occurring today, this book provides a much needed foundation of the science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, fiber optics, biotechnology, and pharmaceuticals. Divided into four sections, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas.

Inhaltsverzeichnis

Frontmatter

Theory of Ellipsometry

Frontmatter
1. Polarized Light and Ellipsometry
Josef Humlíček
2. Optical Physics of Materials
Robert W. Collins, Andre S. Ferlauto
3. Data Analysis for Spectroscopic Ellipsometry
Gerald E. Jellison Jr.

Instrumentation

Frontmatter
4. Optical Components and the Simple PCSA (Polarizer, Compensator, Sample, Analyzer) Ellipsometer
Harland G. Tompkins
5. Rotating Polarizer and Analyzer Ellipsometry
Robert W. Collins, Ilsin An, Chi Chen
6. Polarization Modulation Ellipsometry
Gerald E. Jellison Jr., Frank A. Modine
7. Multichannel Ellipsometry
Robert W. Collins, Ilsin An, Joungchel Lee, Juan A. Zapien

Critical Reviews of Some Applications

Frontmatter
8. SiO2 Films
8.4 Conclusions
Ellipsometry either alone or in combination with other techniques has significantly impacted every area of SiO2 film development since the 1960s. This chapter follows the evolution of the understanding of SiO2 films in microelectronics emphasizing the role of ellipsometry. Ellipsometry continues to be a crucial characterization technique both in microelectronics and thin film research and in manufacturing. Indeed ellipsometers can be found in virtually every IC chip manufacturing facility around the world. The application of ellipsometry to issues involving SiO2 films is an ideal venue for the demonstration of all the aspects of this powerful optical technique.
Eugene A. Irene
9. Theory and Application of Generalized Ellipsometry
Mathias Schubert

Emerging Areas in Ellipsometry

Frontmatter
10. VUV Ellipsometry
James N. Hilfiker
11. Spectroscopic Infrared Ellipsometry
Arnulf Röseler
12. Ellipsometry in Life Sciences
Hans Arwin
Backmatter
Metadaten
Titel
Handbook of Ellipsometry
herausgegeben von
Harland G. Tompkins
Eugene A. Irene
Copyright-Jahr
2005
Verlag
Springer Berlin Heidelberg
Electronic ISBN
978-3-540-27488-9
Print ISBN
978-3-540-22293-4
DOI
https://doi.org/10.1007/3-540-27488-X

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