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Erschienen in:
1999 | OriginalPaper | Buchkapitel
Low-Energy Scanning Electron Microscope for Nanolithography
verfasst von : A. Zlatkin, N. García
Erschienen in: Impact of Electron and Scanning Probe Microscopy on Materials Research
Verlag: Springer Netherlands
Enthalten in: Professional Book Archive
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We present a new low-energy (~300 eV) scanning electron microscope with 30-nm resolution. The instrument operates with a flat integrated chip lens which performs electron extraction, e-beam focusing and deflection. An important feature is that the electron emitter is positioned 1-2 mm away from the extractor anode (consisting of an aperture of 1 μm diameter), so that their precise alignment is not necessary. The extension of the application of the instrument to a multicolumn array of electron beams for multipattern writing is quite feasible.