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Journal of Materials Science

Erschienen in:

01.04.2016 | Original Paper

Pd-doped organosilica membrane with enhanced gas permeability and hydrothermal stability for gas separation

verfasst von: Huating Song, Shuaifei Zhao, Jiaojiao Lei, Chenying Wang, Hong Qi

Erschienen in: Journal of Materials Science | Ausgabe 13/2016

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Abstract

A Pd-doped organosilica membrane based on bis(triethoxysilyl)ethane is successfully developed by the polymeric sol–gel method. Its microstructure, chemical composition, and separation performance are compared with those of the undoped organosilica membrane. Gas adsorption analysis indicates that the Pd-doped organosilica membrane has larger micropores compared with the undoped organosilica membrane. The gas permeation results show that the Pd-doped organosilica membrane has much higher gas permeances than the undoped organosilica membrane due to the enlarged micropores after Pd-doping. The Pd-doped organosilica membrane also exhibits a significantly improved hydrothermal stability. The enhanced hydrothermal stability can be explained by the mechanism that Pd particles act as inhibitors and prevent the formation of mobile silica groups (e.g., Si–OH) under steam condition. Metal-doping (e.g., Pd-doping in this work) may offer a new approach to develop high performance membranes with enhanced gas permeances and hydrothermal stabilities in gas separation applications.

Vorheriger Artikel Simple emulsion technique as an innovative template for preparation of porous, spongelike poly(lactide-co-glycolide) microspheres with pore-closing capability

Nächster Artikel Investigation of the non-equilibrium solidification microstructure of a Mg–4Al–2RE (AE42) alloy

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Titel: Pd-doped organosilica membrane with enhanced gas permeability and hydrothermal stability for gas separation
verfasst von: Huating Song
Shuaifei Zhao
Jiaojiao Lei
Chenying Wang
Hong Qi
Publikationsdatum: 01.04.2016
Verlag: Springer US
Erschienen in: Journal of Materials Science / Ausgabe 13/2016
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI: https://doi.org/10.1007/s10853-016-9924-5

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