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Journal of Nanoparticle Research

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01.09.2013 | Research Paper

Pressure-dependent synthesis of high-quality few-layer graphene by plasma-enhanced arc discharge and their thermal stability

verfasst von: Rajesh Kumar, Rajesh Kumar Singh, Pawan Kumar Dubey, Pradip Kumar, Radhey Shyam Tiwari, Il-Kwon Oh

Erschienen in: Journal of Nanoparticle Research | Ausgabe 9/2013

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Abstract

In this article, a simple and cost-effective method to produce high-quality few-layer graphene (FLG) sheets (~4 layers) have been achieved by the direct current arc discharge under argon atmosphere, using pure graphite rods as the electrodes. Ar was used as a buffer gas with pure graphite rods as anode and cathode electrodes. We explored the suitable conditions for producing FLG by changing the Ar gas pressure inside the arcing chamber. This method has several advantages over the previous methods to produce graphene for research applications. No toxic and hazardous intercalant was used for producing FLG in this process. The optimum Ar pressure was 500 Torr, for producing minimum number of FLG and this also shows the good thermal stability. The FLG product so obtained has been characterized by X-ray diffraction, scanning and electron microscopy, Raman and Fourier transform infrared spectroscopy. Thermal stabilities of FLG were determined by thermal gravimetric analysis.

Vorheriger Artikel Nanosphere-Decorated Tunable Anatase Titania Conic Self-Assemblies

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Titel: Pressure-dependent synthesis of high-quality few-layer graphene by plasma-enhanced arc discharge and their thermal stability
verfasst von: Rajesh Kumar
Rajesh Kumar Singh
Pawan Kumar Dubey
Pradip Kumar
Radhey Shyam Tiwari
Il-Kwon Oh
Publikationsdatum: 01.09.2013
Verlag: Springer Netherlands
Erschienen in: Journal of Nanoparticle Research / Ausgabe 9/2013
Print ISSN: 1388-0764
Elektronische ISSN: 1572-896X
DOI: https://doi.org/10.1007/s11051-013-1847-3

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