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Erschienen in:
1988 | OriginalPaper | Buchkapitel
Raman Spectra of SiO2 Fibers at High Tensile Strain
verfasst von : Hiroshi Kobayashi, Kazuhiro Ema
Erschienen in: The Physics and Technology of Amorphous SiO2
Verlag: Springer US
Enthalten in: Professional Book Archive
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Raman spectra were obtained for SiO2 fibers of 125 μm diameter at tensile strains ranging form 0 to 3.5.%. The spectrum only for the main peak at 440 cm-1 decreased its height with increase in the tensile strain. All the Raman spectra observed were decomposed into their Gaussian components, which are then assigned to normal vibration modes of either SiO4 or Si2O molecules. It is concluded that the stress-induced change in the Raman spectrum near 440 cm-1 is principally due to a change in the tetrahedral angle of the SiO4 molecules constituting silica networks and not to either a Si-0 bond stretching or a Si-0-Si bond angle broadening.