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Erschienen in:
1988 | OriginalPaper | Buchkapitel
UV and VUV Optical Absorption due to Intrinsic and Laser Induced Defects in Synthetic Silica Glasses
verfasst von : H. Imai, K. Arai, T. Saito, S. Ichimura, H. Nonaka, J. P. Vigouroux, H. Imagawa, H. Hosono, Y. Abe
Erschienen in: The Physics and Technology of Amorphous SiO2
Verlag: Springer US
Enthalten in: Professional Book Archive
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We examined twelve kinds of synthetic silica glasses prepared by various methods, such as flame hydrolysis plasma-CVD, CVD-soot remelting and sol-processes. Each synthetic method and preparation process could berelated to particular intrinsic defects in the glasses such as hydroxyl groups, peroxy-linkages and oxygen-deficient defects. It was found that excess absorption near the band edge was caused in each case by the dominant intrinsic defects. The E’ center induced by ArF laser irradiation in the glasses containing oxygen-deficient defects was found quite stable at room temperature, whilst for glasses containing other dominant defects, it was unstable. The irradiation effects on the 7.6 and 5.0 eV absorption bands strongly suggest that these bands originate from oxygen-deficient defect.