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Erschienen in:
Cesium Lead Bromides—Structural, Electronic and Optical Properties Kapitel lesen Erstes Kapitel lesen

2021 | OriginalPaper | Buchkapitel

Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes

verfasst von : Samiha Hossain, Oktay H. Gokce, N. M. Ravindra

Erschienen in: TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings

Verlag: Springer International Publishing

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Abstract

The continued evolution in nanoelectronics and nanophotonics has been made possible by the recent developments in Atomic Layer Deposition and Atomic Layer Etching. While uniform deposition of conformal films with controllable thickness is a key feature of Atomic Layer Deposition, Atomic Layer Etching offers the advantages of controlled removal of chemically modified areas. Various case studies of the applications of these technologies in dielectrics, metals and diffusion barriers will be discussed.

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Metadaten
Titel
Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes
verfasst von
Samiha Hossain
Oktay H. Gokce
N. M. Ravindra
Copyright-Jahr
2021
Buch
TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings

Print ISBN: 978-3-030-65260-9

Electronic ISBN: 978-3-030-65261-6

Copyright-Jahr: 2021

DOI
https://doi.org/10.1007/978-3-030-65261-6_20

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