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2013 | OriginalPaper | Buchkapitel

4. Chemical Vapor Deposition of Carbon Nanotubes

verfasst von : Zhifeng Ren, Yucheng Lan, Yang Wang

Erschienen in: Aligned Carbon Nanotubes

Verlag: Springer Berlin Heidelberg

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Abstract

Chemical vapor deposition is a popular industrial method to grow carbon nanotubes because of the mass production at low cost. Such method is also a very important technique to in situ align carbon nanotubes. In this chapter, we introduce various chemical vapor deposition methods, including thermal chemical vapor deposition and plasma-enhanced chemical vapor deposition, as well as the mechanism of growth and alignment.

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Titel: Chemical Vapor Deposition of Carbon Nanotubes
verfasst von: Zhifeng Ren
Yucheng Lan
Yang Wang
Verlag: Springer Berlin Heidelberg
Buch: Aligned Carbon Nanotubes
Print ISBN: 978-3-642-30489-7

Electronic ISBN: 978-3-642-30490-3

Copyright-Jahr: 2013
DOI: https://doi.org/10.1007/978-3-642-30490-3_4

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