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2002 | OriginalPaper | Buchkapitel

Chemical Vapor Deposition of Superconductor and Oxide Films

verfasst von : G. Wahl, J. Arndt, O. Stadel

Erschienen in: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Verlag: Springer Netherlands

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Chemical Vapor Deposition (CVD) of oxides is a very large branch in the field of CVD processes and is always a large part in books about CVD [1].

Metadaten
Titel
Chemical Vapor Deposition of Superconductor and Oxide Films
verfasst von
G. Wahl
J. Arndt
O. Stadel
Copyright-Jahr
2002
Verlag
Springer Netherlands
DOI
https://doi.org/10.1007/978-94-010-0353-7_7

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