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Colloid and Polymer Science
Erschienen in: Colloid and Polymer Science 7/2015

01.07.2015 | Original Contribution

Colloidal crystallization of C60/polymer-grafted silica particles in organic solvent

verfasst von: Yin Yang, Teruhisa Ohno, Kohji Yoshinaga

Erschienen in: Colloid and Polymer Science | Ausgabe 7/2015

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Abstract

Synthesis of fullerene (C60)-tethered polymer-grafted silica and colloidal crystallization of the particles was investigated. The particles were prepared by the reaction of C60 with 4-azidobenzoyl groups introduced in poly(methyl methacrylate-co-2-hydroxyethyl methacrylate), followed by esterification of 2-hydroxyethyl metharylate moieties with 4-azidobenzoyl chloride and grafting onto colloidal silica. The reaction afforded bindings of C60 in the range from 0.44 × 104 to 1.71 × 104 molecules/particle. The C60 amounts did not monotonously increase with 4-azidobenzoyl group on the particles, but decreased with mole fraction of methyl methacrylate in the copolymer. Colloidal crystallizations of the C60-tethered silica particles were observed in acetonitrile with critical volume fractions in the range from 0.018 to 0.024. Inter-sphere distances in the colloidal crystals were consistent with calculated values on assumption of face-centered cubic-closed packing, and then it was suggested that the crystallization took place due to electrostatic repulsion between the particles.
Vorheriger Artikel Understanding the effects of nucleating agent concentration on the polymorphic behavior of β-nucleated isotactic polypropylene with different melt structures
Nächster Artikel A model filler network in nanocomposites prepared by in situ silica filling and peroxide cross-linking in natural rubber latex

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Metadaten
Titel
Colloidal crystallization of C60/polymer-grafted silica particles in organic solvent
verfasst von
Yin Yang
Teruhisa Ohno
Kohji Yoshinaga
Publikationsdatum
01.07.2015
Verlag
Springer Berlin Heidelberg
Erschienen in
Colloid and Polymer Science / Ausgabe 7/2015
Print ISSN: 0303-402X
Elektronische ISSN: 1435-1536
DOI
https://doi.org/10.1007/s00396-015-3601-0

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