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Erschienen in:
1988 | OriginalPaper | Buchkapitel
Effects of Processing on Radiation Damage Thresholds in Silica Glasses
verfasst von : R. F. Haglund Jr., D. L. Kinser, H. Mogul, N. H. Tolk, P. W. Wang, R. A. Weeks
Erschienen in: The Physics and Technology of Amorphous SiO2
Verlag: Springer US
Enthalten in: Professional Book Archive
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We report experimental evidence linking near-surface radiation damage mechanisms to identifiable variations in the manufacturing process of silica glasses. We have bombarded a well-characterized set of Suprasil and Spectrosil glasses with ions and electrons under ultrahigh vacuum conditions. Relative yields of atoms and molecules desorbed from the sample glasses were obtained from the characteristic optical spectra; the time dependence of the bulk luminescence arising from electronic excitations in the near-surface bulk was also monitored. Comparison of these data with other work suggest a correlation between radiation damage susceptibility and the OH content of the fused silica.