Growth Kinetics and Microstructure Evolution of Intermediate Phases in MoSi₂-Si₃N₄-WSi₂/Mo Diffusion Couples

The growth kinetics and silicon diffusion coefficients of intermediate silicide phases in MoSi₂-3.5 vol.% Si₃N₄-5.0 vol.% WSi₂/Mo diffusion couple prepared by spark plasma sintering were investigated in temperatures ranging from 1200 to 1500 °C. The intermediate silicide phases were characterized by x-ray diffraction. The microstructures and components of the MoSi₂-Si₃N₄-WSi₂/Mo composites were investigated using scanning electron microscope with energy-dispersive spectroscopy. A special microstructure with MoSi₂ core surrounded by a thin layer of (Mo,W)Si₂ ring was found in the MoSi₂-Si₃N₄-WSi₂ composites. The intermediate layers of Mo₅Si₃ and (Mo,W)₅Si₃ in the MoSi₂-Si₃N₄-WSi₂/Mo diffusion couples were formed at different diffusion stages, which grew parabolically. Activation energy of the growth of intermediate layers in MoSi₂-3.5 vol.% Si₃N₄-5.0 vol.% WSi₂/Mo diffusion couple was calculated to be 316 ± 23 kJ/mol. Besides, the hindering effect of WSi₂ addition on the growth of intermediate layers was illustrated by comparing the silicon diffusion coefficients in MoSi₂-3.5 vol.% Si₃N₄-5.0 vol.% WSi₂/Mo and MoSi₂-3.5 vol.% Si₃N₄/Mo diffusion couples. MoSi₂-3.5 vol.% Si₃N₄-5.0 vol.% WSi₂ coating on Mo substrate exhibited a better high-temperature oxidation resistance in air than that of MoSi₂-3.5 vol.% Si₃N₄ coating.