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2022 | OriginalPaper | Buchkapitel

7. Ion Beam Figuring and Smoothing

verfasst von : Bernd Rauschenbach

Erschienen in: Low-Energy Ion Irradiation of Materials

Verlag: Springer International Publishing

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Abstract

The technologies, ion beam figuring (IBF) and ion beam-induced smoothing (IBS), are used to precisely remove imperfections or correct surface shape in a predetermined and controlled manner. The IBF method uses the computer-aided codes to realize the desired surface topography, where a spatially and temporally stable ion beam is passed vertically over the surface at a fixed distance in a high-vacuum environment. The main input variables of this approach, the ion beam removal function, the surface error function and the dwell time procedure, are presented. The various algorithms (Fourier transform algorithm, iterative dwell algorithm, matrix based algorithm, Bayesian algorithm) for determining the dwell time of the ion beam over each object point to be machined and the effect of temperature during the figuring procedure are discussed. The application of IBF technology for the correction of shape errors on surfaces to achieve depth accuracies in the nanometer and sub-nanometer range over the entire spectrum of the spatial surface wavelength is demonstrated with selected examples. Ion beam-induced smoothing (IBS) focuses on feature processing (spatial wavelength < a few microns and height amplitudes on the order of nanometers) with the aim of producing ultra-smooth surfaces. In addition to direct smoothing by low-energy ions, the technologies of smoothing with a planarization layer and smoothing by means of ions incident at a very oblique angle have also become established. Atomistic surface relaxation processes such as ion beam enhanced viscous flow, thermally activated surface diffusion, effective ion-induced diffusion, and ballistic mass redistribution can contribute to the smoothing process.

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Vorheriges Kapitel Evolution of Topography Under Low-Energy Ion Bombardment
Nächstes Kapitel Low-Energy Ion Beam Bombardment-Induced Nanostructures
Literatur
1.
M.J. Nobes, J.S. Colligon, G. Carter, The equilibrium topography of sputtered amorphous solids. J. Mater Sci. 4, 730–733 (1969)CrossRef
2.
G. Carter, J.S. Colligon, M.J. Nobes, The equilibrium topography of sputtered amorphous solids II. J. Mater Sci. 6, 115–117 (1971)CrossRef
3.
G. Carter, The physics and applications of ion beam erosion. J. Phys. D: Appl. Phys. 34, R1–R22 (2001)CrossRef
4.
F.C. Frank, On the kinematic theory of crystal growth and dissolution processes II. Z. Phys. Chem. 77, 84–92 (1972)CrossRef
5.
G. Carter, Theory of surface erosion and growth, in Erosion and Growth of Solids Stimulated by Atom and Ion Beams, ed. by G. Kiriakidis, G. Carter, J.L. Whitton, (Proceed. NATO ASI Series E 112, Martinus Nijhoff’, Dordrecht, 1986) pp. 70–97
6.
A. Schindler, G. Boehm, T. Haensel, W. Frank, A. Nickel, B. Rauschenbach, F. Bigl, Precision optical asphere fabrication by plasma jet chemical etching (PJCE) and ion beam figuring. Proc. SPIE 4451, 242–248 (2001)CrossRef
7.
T. Hänsel, P. Seidel, A. Nickel, A. Schindler, B. Rauschenbach, Deterministic ion beam figuring of surface errors in sub-millimeter spatial wavelength range, in Proceeding of 6th EUSPAN International Conferences Baden/Wien (2006)
8.
A. Schindler, T. Hänsel, A. Nickel, F. Frost, H.-J. Thomas, H. Neumann, G. Seidenkranz, R. Schwabe, S. Gürtler, S. Görsch, A. Bogatz, B. Rauschenbach, Ion beam figuring (IBF) solutions for high performance optics surface finishing from meter to millimeter spatial wavelength range, in Proceeding of 3rd International Conferences on Leading Edge Manufacturing in 21st century, Nagoya (2005)
9.
N. Savvides, A. Knittel, Ion beam figuring of optics, CSIRO report CIP2152 (2004).
10.
X. Xuhui, L. Shengyi, Ion beam figuring technology, in Handbook of Manufacturing Engineering and Technology, ed. by A.Y.C. Nee, (Springer, London 2015), pp. 1343–1390
11.
A. Schindler, T. Hänsel, D. Flamm, G. Boehm, F. Frost, R. Fechner, B. Rauschenbach, Ion beam and plasma jet etching for optical component fabrication. Proc SPIE 4440, 217–227 (2001)CrossRef
12.
R. Castaing, P. Laborie, Aspects partieuliers de l`etude des métaux en coupes mines. Compt. Rend. 238, 1885–1887 (1954)
13.
A.B. Meinel, S. Bashkin, D.A. Loomis, Controlled figuring of optical surfaces by energetic ionic beams. Appl. Optics 4, 1647–1647 (1965)CrossRef
14.
J.B. Schroeder, S. Bashkin, J.F. Nester, Ionic polishing of optical surfaces. Appl. Optics 5, 1031–1034 (1966)CrossRef
15.
P.H. Schmidt, E.G. Spencer, E.M. Walters, Ion milling of magnetic oxide platelets for the removal of surface and near-surface imperfections and defects. J. Appl. Phys. 41, 4740–4742 (1970)CrossRef
16.
B. Schroeder, H.D. Dieselman, J.W. Douglass, Technical feasibility of figuring optical surfaces by ion polishing. Appl. Optics 10, 295–299 (1970)CrossRef
17.
R.A. House II., J.R. Bettis, A.H. Guenther, Appl. Optics 16, 1486–1488 (1977)CrossRef
18.
D.T. Hawkins, Ion milling (ion beam etching), 1954–1975: a bibliography. J. Vac. Sci. Technol. 12, 1389–1397 (1975)CrossRef
19.
H.R. Kaufman, P.D. Reader, G.C. Isaacson, Ion sources for ion machining applications. AIAA J. 15, 843–847 (1977)CrossRef
20.
S.R. Wilson, J.R. McNeil, Surface figuring using neutral ion beams. Proc. SPIE 966, 74–81 (1989)CrossRef
21.
L.N. Allen, H.W. Romig, Demonstration of an ion figuring process. Proc. SPIE 1333, 22–33 (1990)CrossRef
22.
R.L. Seliger, W.P. Fleming, Focused ion beams in microfabrication. J. Appl. Phys. 45, 1416–1422 (1974)CrossRef
23.
P. Sigmund, Theory of sputtering I. Sputtering yield of amorphous and polycrystalline targets, Phys. Rev. 184, 383–416 (1969) and Y. Yamamura, An empirical formula for angular dependence of sputtering yields. Rad. Effects 80, 57–72 (1984)
24.
S. Wilson, J. McNeil, Neutral ion beam figuring of large optical surfaces. Curr. Dev. Optical Eng. II(818), 320–325 (1987)
25.
T.W. Drueding, T.G. Bifano, S.C. Fawcett, Contouring algorithm for ion figuring. Precis. Eng. 17, 10–21 (1995)CrossRef
26.
T. Wang, L. Huang, H. Kang, H. Choi, D.W. Kim, K. Tayabaly, M. Idir, Transform-based dwell time algorithm for ultra-precision ion beam figuring of synchrotron mirrors. Sci. Rep 10, 813 (2020)
27.
T. Wang, L. Huang, M. Vescovi, D. Kuhne, K. Tayabaly, N. Bouet, M. Idir, Study on an effective one-dimensional ion-beam figuring method. Opt. Express 27, 15368–15381 (2019)CrossRef
28.
29.
S. Wilson, D. Reicher, C. Kranenberg, J. McNeil, P. White, P. Martin, D. McCready, Ion beam milling of fused silica for window fabrication, in Laser-Induced Damage in Optical Materials, ed. by H. Bennett, L. Chase, A. Guenther, B. Newnam, M. Soileau, (West Conshohocken), ASTM International 1441, 82–86 (1991)
30.
P.H. van Cittert, Zum Einfluss der Spaltbreite auf die Intensitätsverteilung in Spektrallinien II. Z. Phys. 69, 298–308 (1931)CrossRef
31.
W.H. Richardson, Bayesian-based iterative method of image restoration, J. Opt. Soc. Am. 62, 55–59 (1972) and L.B. Lucy, An iterative technique for the rectification of observed distributions. Astronom. J. 79, 745–754 (1974)
32.
R. Gold, An iterative unfolding method for response matrices, (Argonne National Laboratory Report ANL-6984, 1964)
33.
Ch. Xu, I, Aissaoui, S. Jacquey, Algebraic analysis of the Van Cittert iterative method of deconvolution with a general relaxation factor. J. Opt. Soc. Am. A 11 (1994) 2804-2808
34.
J.F. Wu, Z.W. Lu, H.X. Zhang, T.S. Wang, Dwell time algorithm in ion beam figuring. Appl. Opt. 48, 3930–3937 (2009)CrossRef
35.
T. Hänsel, A. Nickel, A. Schindler, Ion beam figuring of strongly curved surfaces with a (x, y, z) linear three-axes system, OAS Tech. Digest (Opt. Soc. Am., 2008) paper JWD6
36.
Y.S. Ghim, S.-J. Shin, H.-G. Rhee, H.-S. Yang, Y.-M. Lee, Ultra-precision surface polishing using ion beam figuring. Proc. SPIE 8416 (2012)
37.
A. Haberl, R. Rascher, Yet one more dwell time algorithm. Proc. SPIE 103026 (2017)
38.
C.L. Carnal, C.M. Egert, K.W. Hylton, Advanced matrix-based algorithm for ion-beam milling of optical components. Proc. SPIE 1752, 54–63 (1992)CrossRef
39.
L. Zhou, Y. Dai, X. Xie, C. Jiao, S. Li, Model and method to determine dwell time in ion beam figuring. Nanotechnol. Precis. Eng. 5, 107–112 (2007)
40.
C.C. Paige, M.A. Saunders, LSQR: An algorithm for sparse linear equations and sparse least squares. ACM Trans. Math Softw 8, 43–71 (1982)CrossRef
41.
C. Jiao, S. Li, X. Xie, Algorithm for ion beam figuring of low-gradient mirrors. Appl. Opt. 48, 4090–4096 (2009)CrossRef
42.
J.M. Bernardo, A.F.M. Smith, Bayesian theory (Wiley, Chichester, 2000)
43.
M. Ghigo, G. Vecchi, S. Basso, O. Citterio, M. Civitani, G. Pareschi, G. Sironi, Ion beam figuring technique used as final step in the manufacturing of the optics for the E-ELT. Mem. Soc. Astro. 86, 412–415 (2015)
44.
P. Gailly, J.P. Collette, L. Renson, J.-P. Tock, Ion beam figuring of small BK7 and zerodur optics: thermal effects. Proc. SPIE 3739 (1999)
45.
X. Xie, Y. Hao, L. Zhou, Y. Dai, S. Li, High thermal expansion optical component machined by ion beam figuring. Opt. Eng. 51, 013401 (2012)
46.
F. Li, X. Xie, G. Tie, H. Hu, L. Zhou, Research on temperature field of KDP crystal under ion beam cleaning. Appl. Opt. 56, 4888–5489 (2016)CrossRef
47.
P.D. Parry, Target heating during ion implantation, J. Vac. Sci. Technol. 13, 622–629 (1976) and Localized substrate heating during ion implantation, 15, 111–115 (1978)
48.
A. Schindler, T. Hänsel, F. Frost, G. Böhm, W. Frank, A. Nickel, T. Arnold, R. Schwabe, S. Gürtler, S. Görsch, B. Rauschenbach, Modern methods of highly precise figuring and polishing, in Proceed of 3rd DGG Symposium, Glass Science and Technology (vol. 78 C, 2005), pp. 111–114
49.
M. Weiser, Quantitative investigations of the removal of glass material by low energy ion beams with the use of optical interferometry. Nucl. Instr. Meth. Phys. Res. B 80(81), 1174–1177 (1993)CrossRef
50.
T. Hänsel, F. Frost, A. Nickel, A. Schindler, Ultra-precision surface finishing by ion beam techniques. Vak. Forsch. Praxis 19, 24–30 (2007)CrossRef
51.
T. Hänsel, A. Nickel, A. Schindler, H.-J. Thomas, Ion beam figuring surface finishing of x-ray and synchrotron beam line optics using stitching interferometry for the surface topography measurement, in Conference on Optical Society America (OSA, Rochester 2004), Paper OMD 5
52.
A. Schindler, T. Hänsel, F. Frost, A. Nickel, R. Fechner, B. Rauschenbach, Recent achievements on ion techniques for optics fabrication, in Conference on Optical Society America (OSA, Rochester 2004), Paper OMC 3
53.
L.N. Allen, J.J. Hannon, R.W. Wambach, Final surface error correction of an off-axis aspheric petal by ion figuring. Proc. SPIE 1543 (1992)
54.
A. Schindler, F. Frost, A. Nickel, T. Hänsel, B. Rauschenbach, Ion beam assisted smoothing of surfaces, in Proceeding of 1st International Conference on Micro- and Nano-Technology Vienna (2005), pp. 367–374 and A. Schindler, Tutorial on recent advances in ion beam and plasma jet processing, (Optical Fabrication and Testing (OAS), Paper OW4D.1, 2012)   pp. 43–45
55.
R.E. Wilson, Ionic polishing of fused silica and glass. Opt. Technol. 2, 19–26 (1970)CrossRef
56.
M. Tarasevich, Ion beam erosion of rough glass surfaces. Appl. Opt. 9, 173–176 (1970
57.
A.F. Perveyev, V.V. IL’in, A.V. Mikhaylov, Ion polishing of Glass. Sov. J. Opt. Technol. 39, 622–624 (1972)
58.
F. Frost, B. Ziberi, A. Schindler, B. Rauschenbach, Surface engineering with ion beams: from self-organized nanostructures to ultra-smooth surfaces. Appl. Phys. A 91, 551–559 (2008)CrossRef
59.
D.J. Barber, F.C. Frank, M. Moss, J.-W. Steeds, I.S.T. Tsong, Prediction of ion bombarded surface topographies using Frank’s kinematic theory of crystal dissolution. J. Mater Sci. 8, 1030–1040 (1973)CrossRef
60.
R. Smith, M.A. Tagg, J.M. Walls, Deterministic models of ion erosion, reflection and redeposition. Vacuum 34, 175–180 (1984)CrossRef
61.
G. Carter, J.S. Colligon, M.J. Nobes, Analytical modelling of sputter induced surface morphology. Rad. Eff. 31, 65–87 (1977)CrossRef
62.
R.M. Bradley, J.M.E. Harper, Theory of ripple topography induced by ion bombardment.  J. Vac. Sci. Technol. A 6, 2390–2396 (1988)CrossRef
63.
G. Carter, M.J. Nobes, I.V. Katardjiev, The production of repetitive surface features by oblique incidence ion bombardment. Phil. Mag. B 68, 231–236 (1993)CrossRef
64.
E. Chason, T.M. Mayer, B.K. Kellerman, D.T. McIlroy, A.J. Howard, Roughening instability and evolution of the Ge(001) surface during lon sputtering. Phys. Rev. Lett. 72, 3040–3043 (1994)CrossRef
65.
R. Cuerno, A.-L. Barabási, Dynamic scaling of ion–sputtered surfaces. Phys. Rev. 74, 4746–4749 (1995)
66.
R. Cuerno, H.A. Makse, S. Tomassone, S.T. Harrington, H.E. Stanley, Stochastic model for surface erosion via ion-sputtering: dynamical evolution from ripple morphology to rough morphology. Phys. Rev. Lett. 75, 4464–4467 (1995)CrossRef
67.
C. Herring, Effect of change of scale on sintering phenomena. J. Appl. Phys. 21, 301–303 (1950)CrossRef
68.
W.M. Tong, R.S. Williams, Kinetics of surface growth: Phenomenology, scaling, and mechanisms of smoothing and roughening. Ann. Rev. Phys. Chem. 45, 401–438 (1994)CrossRef
69.
D.G. Stearns, Stochastic model for thin film growth and erosion. Appl. Phys. Lett. 62, 1745–1747 (1993)CrossRef
70.
W.W. Mullins, Theory of thermal grooving, J. Appl. Phys. 28, 333–339 (1957). W.W. Mullins, Flattening of a nearly plane solid surface due to capillarity. J. Appl. Phys. 30, 77–83 (1959)
71.
A.-L. Barabási, H.E. Stanley, Fractal Concepts in Surface Growth (Cambridge University Press, Cambridge, 1995)CrossRef
72.
S.E. Orchard, On surface levelling in viscous liquids and gels. Appl. Sci. Res., Section A. 11, 451–464 (1963)
73.
M.A. Makeev, A.-L. Barabási, Ion-induced effective surface diffusion in ion sputtering. Appl. Phys. Lett. 71, 2800–2802 (1997)CrossRef
74.
G. Carter, V. Vishnyakov, Roughening and ripple instabilities on ion-bombarded Si. Phys. Rev. B 54, 17647–17653 (1996)CrossRef
75.
W. Liao, Y. Dai, X. Xie, L. Zhou, Microscopic morphology evolution during ion beam smoothing of Zerodur surfaces. Opt. Express 22, 377–386 (2014)CrossRef
76.
W. Liao, Y. Dai, X. Xie, L. Zhou, Deterministic ion beam material adding technology for high-precision optical surfaces. Appl. Optics 52, 1302–1309 (2013)CrossRef
77.
S. Vauth, S.G. Mayr, Relevance of surface viscous flow, surface diffusion, and ballistic effects in keV ion smoothing of amorphous surfaces. Phys. Rev. B 75, 224107 (2007)
78.
F. Frost, R. Fechner, B. Ziberi, J. Völlner, D. Flamm, A Schindler, Large area smoothing of surfaces by ion bombardment: fundamentals and applications. J. Phys.: Condens. Matter. 21, 224026 (2009)
79.
E. Ziegler, L. Peverini, N. Vaxelaire, A. Cordon-Rodriguez, A. Rommeveaux, I.V. Kozhevnikov, J. Susini, Evolution of surface roughness in silicon X-ray mirrors exposed to a low-energy ion beam. Nucl. Instr. Meth. in Phys. Res. A 616, 188–192 (2010)CrossRef
80.
A.J.R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, F. Bijkerk, Surface morphology of Kr+-polished amorphous Si layers. J. Vac. Sci Technol. A 28, 552–558 (2010)CrossRef
81.
K. Morijiri, H. Endo, K. Morikaawa, S.A. Pahlovy, I. Miyamoto, 0.5 keV Xe+ ion beam nano smoothing of ULE substrate after processing with 3.0–10.0 keV Xe+ ion beam, Microelectr. Eng. 88, 2694–2696 (2011)
82.
H. Endo, T. Inaba, S.A. Pahlovy, I. Miyamoto, Low energy Xe+ ion beam machining of ULE substrates for EUVL projection optics—evaluation of high-spatial frequency roughness. Microelectr. Engng. 87, 982–984 (2010)CrossRef
83.
M. Xu, Y. Dai, L. Zhou, X. Peng, S. Chen, W. Liao, Evolution mechanism of surface roughness during ion beam sputtering of fused silica. Appl. Optics 57, 5566–5573 (2018)
84.
N.I. Chkhalo, S.A. Churin, M.S. Mikhaylenko, A.E. Pestov, V.N. Polkovnikov, N.N. Salashchenko, M.V. Zorina, Ion-beam polishing of fused silica substrates for imaging soft X-ray and extreme ultraviolet optics. Appl. Optics 55, 1249–1256 (2016)CrossRef
85.
N.I. Chkhalo, S.A. Churin, A.E. Pestov, N.N. Salashchenko, Yu.A. Vainer, M.V. Zorina, Roughness measurement and ion-beam polishing of super-smooth optical surfaces of fused quartz and optical ceramics. Opt. Express 22, 20094–20106 (2014)CrossRef
86.
P. Becker, H. Friedrich, K. Fujii, W. Giardini, G. Mana, A. Picard, H.-J. Pohl, H. Riemann, S. Valkiers, The Avogadro constant determination via enriched silicon-28. Meas. Sci. Technol. 20, 092002 (2009)
87.
T. Arnold, F. Pietag, Ion beam figuring machine for ultra-precision silicon spheres correction. Prec. Eng. 41, 119–125 (2015)CrossRef
88.
T. Hino, T. Taguchi, Y. Yamauchi, Y. Hirohata, M. Nishikawa, Surface flatness of polycrystalline copper after argon ion etching followed by annealing. J. Vac. Sci. Technol. B 22, 2632–2634 (2004)
89.
T. Kobayashi, Y. Nobuta, Y. Yamauchi, T. Hino, Oblique argon ion etching for copper at elevated temperature. J. Plasma Fusion Res. Series 8, 1358–1360 (2009)
90.
L.F. Johnson, K.A. Ingersoll, Ion polishing with the aid of a planarizing film. Appl. Opt. 22, 1165–1167 (1983)CrossRef
91.
L.F. Johnson, K.A. Ingersoll, D. Kahng, Planarization of patterned surfaces by ion beam erosion. Appl. Phys. Lett. 40, 636–638 (1982)CrossRef
92.
N. Yamauchi, T. Yachi, T. Wada, A pattern edge profile simulation for oblique ion milling.  J. Vac. Sci. Technol. A2, 1552–1557 (1984)CrossRef
93.
A.I. Stognij, N.N. Novitskii, An ion-beam apparatus for the surface planarization of oxide materials. Instr. Exp. Tech. 45, 141–151 (2002)CrossRef
94.
D.F. Grogan, T. Zhao, B.G. Bovard, H.A. Macleod, Planarizing technique for ion-beam polishing of diamond films. Appl. Optics 31, 1483–1487 (1992)CrossRef
95.
Y. Li, H. Takino, F. Frost, Ion beam planarization of diamond turned surfaces with various roughness profiles. Opt. Express 25, 7828–7838 (2017)CrossRef
96.
F. Frost, H. Takino, R. Fechner, A. Schindler, N. Ohi, K. Nomura, Smoothing of diamond-turned copper surfaces using ion beams with aid of planarizing film Jap. J. Appl. Phys. 46, 6071–6073 (2007)CrossRef
97.
M. Ulitschka, J. Bauer, F. Frost, T. Arnold, Ion beam planarization of optical aluminum surfaces. J. Astron. Telesc. Instrum. Syst. 6, 014001 (2020)
98.
F. Frost, R. Fechner, D. Flamm, B. Zberi, W. Frank, A. Schindler, Ion beam assisted smoothing of optical surfaces. Appl. Phys. A 78, 651–654 (2004)CrossRef
99.
P. Oelhafen, J.L. Freeouf, G.D. Pettit, J.M. Woodall, Elevated temperature low energy ion cleaning of GaAs. J. Vac. Sci. Technol. B 1, 787–790 (1983)CrossRef
100.
U. von Gemmingen, R. Sizmann, Charge states of slow hydrogen ions reflected at single crystal surfaces. Surf. Sci. 114, 445–458 (1982). K.J. Snowden, D.J. O`Conner, R.J. MacDonald, Observation of skipping motion in small-angle ion-surface scattering. Phys. Rev. Lett. 61, 1760–176 (1988)
101.
M. Holzwarth, M. Wissing, D.S. Simeonova, S. Tzanev, K.J. Snowdon, O.I. Yordanov, Preparation of atomically smooth surfaces via sputtering under glancing incidence conditions. Surf. Sci. 331–333, 1093–1098 (1995)CrossRef
102.
J.G.C. Labanda, S.A. Barnett, L. Hultman, Sputter cleaning and smoothening of GaAs(001) using glancing-angle ion bombardment. Appl. Phys. Lett. 66, 3114–3116 (1995) and Effects of glancing-angle ion bombardment on GaAs(001). J. Vac. Sci. Technol. B 13, 2260–2268 (1995)
103.
B. Koslowski, S. Strobel, P. Ziemann, Ion polishing of a diamond (100) surface artificially roughened on the nanoscale. Diamond Rel. Mater. 9, 1159–1163 (2000)CrossRef
104.
J.G.C. Labanda, S.A. Barnett, L. Hultman, Damage-free cleaning of Si (001) using glancing-angle ion bombardment. J. Vac. Sci. Technol. B 16, 1885–1890 (1998)CrossRef
105.
M. Wißing, M. Holtzwarth, D.S. Simeonova, K.J. Snowdon, An apparatus for glancing incidence ion beam polishing and characterization of surfaces to angstrom-scale root-mean square roughness. Rev. Sci. Instr. 67, 4314–4320 (1996)CrossRef
106.
M. Wißing, M. Batzill, K.J. Snowdon, Preparation by glancing incidence ion irradiation of CaF2 surfaces with angstrom-scale rms roughness. Nanotechnology 8, 40–45 (1997)CrossRef
Metadaten
Titel
Ion Beam Figuring and Smoothing
verfasst von
Bernd Rauschenbach
Copyright-Jahr
2022
Buch
Low-Energy Ion Irradiation of Materials

Print ISBN: 978-3-030-97276-9

Electronic ISBN: 978-3-030-97277-6

Copyright-Jahr: 2022

DOI
https://doi.org/10.1007/978-3-030-97277-6_7

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