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Erschienen in: Topics in Catalysis 11/2013

01.08.2013 | Original Paper

Kinetics of Palladium Oxidation in the mbar Pressure Range: Ambient Pressure XPS Study

verfasst von: Dmitry Zemlyanov, Bernhard Klötzer, Harald Gabasch, Andrew Smeltz, Fabio H. Ribeiro, Spiros Zafeiratos, Detre Teschner, Peter Schnörch, Elaine Vass, Michael Hävecker, Axel Knop-Gericke, Robert Schlögl

Erschienen in: Topics in Catalysis | Ausgabe 11/2013

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Abstract

Palladium oxidation was studied by ambient-pressure X-ray photoelectron spectroscopy in the mbar pressure range on the Pd(111) and Pd(110) surfaces. The oxidation kinetics on both surfaces show an induction period when the oxidation rate was low at the beginning and then accelerated. The slow initial oxidation is governed by (a) the rate of nucleus formation, and (b) the rate of oxide nucleus growth. Depth profiling varying photon energy/kinetic photoelectron energy pointed to a 3D oxidation. It is remarkable that the oxidation of Pd(110) proceeds at ~100 K lower temperatures than on Pd(111). We suggest that at the high temperature required on Pd(111) nucleation is thermodynamically controlled, and therefore, the nucleation rate decreases with temperature. On Pd(110), nucleation is predominantly kinetically controlled and thus the oxidation rate increases with temperature.

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Metadaten
Titel
Kinetics of Palladium Oxidation in the mbar Pressure Range: Ambient Pressure XPS Study
verfasst von
Dmitry Zemlyanov
Bernhard Klötzer
Harald Gabasch
Andrew Smeltz
Fabio H. Ribeiro
Spiros Zafeiratos
Detre Teschner
Peter Schnörch
Elaine Vass
Michael Hävecker
Axel Knop-Gericke
Robert Schlögl
Publikationsdatum
01.08.2013
Verlag
Springer US
Erschienen in
Topics in Catalysis / Ausgabe 11/2013
Print ISSN: 1022-5528
Elektronische ISSN: 1572-9028
DOI
https://doi.org/10.1007/s11244-013-0052-z

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