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Erschienen in: Journal of Materials Science: Materials in Electronics 8/2016

20.04.2016

Mechanical alloying-spark plasma sintering synthesis and thermoelectric properties of n-type NiSe2+x semiconductors: analysis of intrinsic defects and phase structures

verfasst von: Li-Jun Zheng, Bo-Ping Zhang, Cheng-Gong Han, Jun Pei, Ning Chen

Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 8/2016

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Abstract

A series of bulk samples NiSe2+x (x = 0, 0.01, 0.02, 0.06) were prepared by mechanical alloying (MA) and spark plasma sintering (SPS). The effect of excessive selenium content (x) on the phase structure, microstructure and thermoelectric properties was investigated. The formation energy of intrinsic defects in NiSe2 was calculated using first principle theory. The added selenium initially entered into the Se vacancy (\(V_{Se}^{ \cdot }\)) which is resulted from the Se volatilization during the MA and/or SPS process and subsequently into the interstitial sites (\(Se_{i}^{\prime }\)). An improved absolute value of Seebeck coefficient (|α|) 9.27 μVK−1 at 323 K for the NiSe2.06 was reached along with an inversely varied electrical conductivity (σ) as increasing x. A minimum thermal conductivity (κ) value 3.43 Wm−1 K−1 was achieved at 323 K for the NiSe2.01, along with a high ZT value 0.0049 at 323 K for the NiSe2.02 among NiSe2+x system. Our work provides a preliminary approach towards TE performance enhancement in n-type NiSe2 semiconductors via tailoring Se content in a nonstoichiometry, and will certainly be of value for further exploration of high performance NiSe2 semiconductors by either doping or microstructure controlling.

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Metadaten
Titel
Mechanical alloying-spark plasma sintering synthesis and thermoelectric properties of n-type NiSe2+x semiconductors: analysis of intrinsic defects and phase structures
verfasst von
Li-Jun Zheng
Bo-Ping Zhang
Cheng-Gong Han
Jun Pei
Ning Chen
Publikationsdatum
20.04.2016
Verlag
Springer US
Erschienen in
Journal of Materials Science: Materials in Electronics / Ausgabe 8/2016
Print ISSN: 0957-4522
Elektronische ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-016-4847-0

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