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2011 | OriginalPaper | Buchkapitel

21. MOS Compact Modelling for Flexible Electronics

verfasst von : Slobodan Mijalković

Erschienen in: Ultra-thin Chip Technology and Applications

Verlag: Springer New York

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Abstract

Circuit design in flexible electronics should account for shifts in metal-oxide semiconductor (MOS) characteristics with the mechanical strain induced by substrate bending. Apart from the standard process and layout strain sources, externally applied strain in flexible electronics varies with bending direction and radius. The physical compact models for the strain effects on semiconductor band structure and carrier mobility due to substrate bending are derived in this chapter from basic deformation potential theory. It is demonstrated how existing MOS compact models could be extended for bending-induced strain effect by modification of the set of material model parameters controlling the semiconductor band structure and carrier mobility.

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Literatur
1.
Zurück zum Zitat Kao HL et al (2005) Low noise RF MOSFETs on flexible plastic substrates. IEEE Electron Device Lett 26:489–491CrossRef Kao HL et al (2005) Low noise RF MOSFETs on flexible plastic substrates. IEEE Electron Device Lett 26:489–491CrossRef
2.
Zurück zum Zitat Ahn J-H et al (2007) Bendable integrated circuits on plastic substrates by use of printed ribbons of single-crystalline silicon. Appl Phys Lett 90:213501CrossRef Ahn J-H et al (2007) Bendable integrated circuits on plastic substrates by use of printed ribbons of single-crystalline silicon. Appl Phys Lett 90:213501CrossRef
3.
Zurück zum Zitat Li Y et al (2006) Bendability of single-crystal Si MOSFETs investigated on flexible substrate. IEEE Electron Device Lett 27:538–541CrossRef Li Y et al (2006) Bendability of single-crystal Si MOSFETs investigated on flexible substrate. IEEE Electron Device Lett 27:538–541CrossRef
4.
Zurück zum Zitat Hu C, Liu W (2010) BSIM4: theory and engineering of MOSFET modelling for IC simulation. World Scientific, New Jersey Hu C, Liu W (2010) BSIM4: theory and engineering of MOSFET modelling for IC simulation. World Scientific, New Jersey
5.
Zurück zum Zitat Galup-Montoro G, Schneider MC (2007) MOSFET modelling for circuit analysis and design. World Scientific, New Jersey Galup-Montoro G, Schneider MC (2007) MOSFET modelling for circuit analysis and design. World Scientific, New Jersey
6.
Zurück zum Zitat Enz CC, Vittoz EA (2006) Charge-based MOS transistor modelling: the EKV model form low-power and RF IC design. Wiley, ChichesterCrossRef Enz CC, Vittoz EA (2006) Charge-based MOS transistor modelling: the EKV model form low-power and RF IC design. Wiley, ChichesterCrossRef
7.
Zurück zum Zitat Miura-Mattaucsh M, Mattausch HJ (2008) The physics and modelling of MOSFETSs: surface-potential model HiSIM. World Scientific, New Jersey Miura-Mattaucsh M, Mattausch HJ (2008) The physics and modelling of MOSFETSs: surface-potential model HiSIM. World Scientific, New Jersey
8.
Zurück zum Zitat Dunga MV et al (2008) BSIM CMG: a compact model for multi-gate transistors. In: Colinge J-P (ed) FinFETS and other multi-gate transistors. Springer, New York Dunga MV et al (2008) BSIM CMG: a compact model for multi-gate transistors. In: Colinge J-P (ed) FinFETS and other multi-gate transistors. Springer, New York
9.
Zurück zum Zitat Amstrong GA, Maiti CK (2007) Technology computer aided design for Si, SiGe and GaAs integrated circuits. The Institution of Engineering and Technology, London Amstrong GA, Maiti CK (2007) Technology computer aided design for Si, SiGe and GaAs integrated circuits. The Institution of Engineering and Technology, London
10.
Zurück zum Zitat Ballas RG (2007) Piezoelectric multilayer beam bending actuators: static and dynamic behaviour and aspects of sensor integration. Springer, Berlin Ballas RG (2007) Piezoelectric multilayer beam bending actuators: static and dynamic behaviour and aspects of sensor integration. Springer, Berlin
11.
12.
Zurück zum Zitat Sun Y et al (2007) Physics of strain effects in semiconductors and metal-oxide-semiconductor field-effect transistors. J Appl Phys 101–104503:1–22 Sun Y et al (2007) Physics of strain effects in semiconductors and metal-oxide-semiconductor field-effect transistors. J Appl Phys 101–104503:1–22
13.
Zurück zum Zitat Egley JL, Chidambarrao D (1993) Strain effects on device characteristics: implementation in drift-diffusion simulators. Solid State Electron 36:1653–1664CrossRef Egley JL, Chidambarrao D (1993) Strain effects on device characteristics: implementation in drift-diffusion simulators. Solid State Electron 36:1653–1664CrossRef
14.
Zurück zum Zitat Atlas Users Manual (2010), Silvaco, Santa Clara Atlas Users Manual (2010), Silvaco, Santa Clara
15.
Zurück zum Zitat Wang ZZ, Suski J, Collard E (1993) Piezoresistive simulations MOSFETs. Sensors Actuat A 37–38:357–364CrossRef Wang ZZ, Suski J, Collard E (1993) Piezoresistive simulations MOSFETs. Sensors Actuat A 37–38:357–364CrossRef
16.
Zurück zum Zitat Zhao W, Seabaugh A, Adams V, Jovanović D, Winstead B (2005) Opposing dependence of the electron and hole gate currents in SOI MOSFETs under uniaxial strain. IEEE Electron Device Lett 26:410–412CrossRef Zhao W, Seabaugh A, Adams V, Jovanović D, Winstead B (2005) Opposing dependence of the electron and hole gate currents in SOI MOSFETs under uniaxial strain. IEEE Electron Device Lett 26:410–412CrossRef
17.
Zurück zum Zitat Nayfeh HM, Hoyt JL, Antoniadis DA (2004) A physically based analytical model for the threshold voltage of strain-Si n-MOSFETs. IEEE Trans Electron Devices 51:2069–2072CrossRef Nayfeh HM, Hoyt JL, Antoniadis DA (2004) A physically based analytical model for the threshold voltage of strain-Si n-MOSFETs. IEEE Trans Electron Devices 51:2069–2072CrossRef
18.
Zurück zum Zitat Ji-Song L, Thompson SE, Fossum JG (2004) Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs. IEEE Electron Device Lett 25:731–733CrossRef Ji-Song L, Thompson SE, Fossum JG (2004) Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs. IEEE Electron Device Lett 25:731–733CrossRef
19.
Zurück zum Zitat Venkataraman V, Nawal S, Kumar MJ (2006) A simple analytical threshold voltage model of nanoscale single-layer fully depleted strained-silicon-on-insulator MOSFETs. IEEE Trans Electron Devices 53:2500–2506CrossRef Venkataraman V, Nawal S, Kumar MJ (2006) A simple analytical threshold voltage model of nanoscale single-layer fully depleted strained-silicon-on-insulator MOSFETs. IEEE Trans Electron Devices 53:2500–2506CrossRef
20.
Zurück zum Zitat Matsuda K (2005) Strain-dependent hole masses and piezoresistive properties of silicon. J Comput Electron 3:273–276CrossRef Matsuda K (2005) Strain-dependent hole masses and piezoresistive properties of silicon. J Comput Electron 3:273–276CrossRef
21.
Zurück zum Zitat Tan Y, Li X, Tian L, Yu Z (2008) Analytical electron-mobility model for arbitrary stressed silicon. IEEE Trans Electron Devices 55:1386–1390CrossRef Tan Y, Li X, Tian L, Yu Z (2008) Analytical electron-mobility model for arbitrary stressed silicon. IEEE Trans Electron Devices 55:1386–1390CrossRef
22.
Zurück zum Zitat Dhar S, Kosina H, Palankovski V, Ungersboeck SE, Selberherr S (2005) Electron mobility model for strain-Si devices. IEEE Trans Electron Devices 52:527–533CrossRef Dhar S, Kosina H, Palankovski V, Ungersboeck SE, Selberherr S (2005) Electron mobility model for strain-Si devices. IEEE Trans Electron Devices 52:527–533CrossRef
23.
Zurück zum Zitat Ungersboeck E, Dhar S, Karlowatz G, Sverdlov V, Kosina H, Selberherr S (2007) The effect of general strain on the band structure and electron mobility of silicon. IEEE Trans Electron Devices 54:2183–2190CrossRef Ungersboeck E, Dhar S, Karlowatz G, Sverdlov V, Kosina H, Selberherr S (2007) The effect of general strain on the band structure and electron mobility of silicon. IEEE Trans Electron Devices 54:2183–2190CrossRef
Metadaten
Titel
MOS Compact Modelling for Flexible Electronics
verfasst von
Slobodan Mijalković
Copyright-Jahr
2011
Verlag
Springer New York
DOI
https://doi.org/10.1007/978-1-4419-7276-7_21

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