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01.01.2015 | Original Paper

Multiscale modelling framework for the fracture of thin brittle polycrystalline films: application to polysilicon

verfasst von: Shantanu S. Mulay, Gauthier Becker, Renaud Vayrette, Jean-Pierre Raskin, Thomas Pardoen, Montserrat Galceran, Stéphane Godet, Ludovic Noels

Erschienen in: Computational Mechanics | Ausgabe 1/2015

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Abstract

Micro-electro-mechanical systems (MEMS) made of polycrystalline silicon are widely used in several engineering fields. The fracture properties of polycrystalline silicon directly affect their reliability. The effect of the orientation of grains on the fracture behaviour of polycrystalline silicon is investigated out of the several factors. This is achieved, firstly, by identifying the statistical variation of the fracture strength and critical strain energy release rate, at the nanoscopic scale, over a thin freestanding polycrystalline silicon film having mesoscopic scale dimensions. The fracture stress and strain at the mesoscopic level are found to be closely matching with uniaxial tension experimental results. Secondly, the polycrystalline silicon film is considered at the continuum MEMS scale, and its fracture behaviour is studied by incorporating the nanoscopic scale effect of grain orientation. The entire modelling and simulation of the thin film is achieved by combining the discontinuous Galerkin method and extrinsic cohesive law describing the fracture process.

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Fußnoten
1
These units are modified in the simulation setup to avoid bad conditioning numbers.
 
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Metadaten
Titel
Multiscale modelling framework for the fracture of thin brittle polycrystalline films: application to polysilicon
verfasst von
Shantanu S. Mulay
Gauthier Becker
Renaud Vayrette
Jean-Pierre Raskin
Thomas Pardoen
Montserrat Galceran
Stéphane Godet
Ludovic Noels
Publikationsdatum
01.01.2015
Verlag
Springer Berlin Heidelberg
Erschienen in
Computational Mechanics / Ausgabe 1/2015
Print ISSN: 0178-7675
Elektronische ISSN: 1432-0924
DOI
https://doi.org/10.1007/s00466-014-1083-4

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