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Erschienen in: Microsystem Technologies 1-2/2010

01.01.2010 | Technical Paper

Phenomenological nanoindentation technique in quality control of optoelectronics devices

verfasst von: Antanas Daugela, Norm Gitis, Vladimir Gelfeindbein

Erschienen in: Microsystem Technologies | Ausgabe 1-2/2010

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Abstract

Multiphase and porous ceramic materials are being used as passive semiconductors for building modern optoelectronics devices. Prescreening of the critical parts for subsurface defects before assembly can prevent device failures in the field. A new nanoindentation based non-destructive method has been proposed where shapes of loading–unloading curves can fingerprint subsurface cracking and material porosity induced inelastic behavior in defected multiphase, rough and porous ceramic parts. In addition to the differences in nanoindentation loading-unloading curve shapes, nanohardness values associated with the cracked contact surfaces were 40% lower. The non-destructive nanoindentation results agree well with the destructive Knoop’s microhardness results. A commercially available nanoindentation instrument integrated into the tribometer together with high-resolution optical microscope was utilized for automated and qualitative/quantitative surface materials properties characterization of optoelectronics parts. The proposed instrument and nondestructive testing method can be used for quality control of optoelectronics parts before assembly, significantly improving the yields.

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Literatur
Zurück zum Zitat Anstis GR, Chanticol P, Lawn BR, Marshall DB (1981) A critical evaluation of indentation techniques for measuring fracture toughness: I, direct crack measurements. J Am Ceram Soc 64:533–538CrossRef Anstis GR, Chanticol P, Lawn BR, Marshall DB (1981) A critical evaluation of indentation techniques for measuring fracture toughness: I, direct crack measurements. J Am Ceram Soc 64:533–538CrossRef
Zurück zum Zitat Bushan B (1999) Microtribology. CRC Press, New York Bushan B (1999) Microtribology. CRC Press, New York
Zurück zum Zitat Fisher-Cripps A (2002) Nanoindentation. Springer-Verlag, New York Fisher-Cripps A (2002) Nanoindentation. Springer-Verlag, New York
Zurück zum Zitat Gerberich WW, Tymiak NI, Kramer DE, Daugela A, Jungk JM, Li M (2002) An approach to dry friction and wear for small volumes. Philos Mag A 82:3349–3360 Gerberich WW, Tymiak NI, Kramer DE, Daugela A, Jungk JM, Li M (2002) An approach to dry friction and wear for small volumes. Philos Mag A 82:3349–3360
Zurück zum Zitat Gitis N, Daugela A, Xiao J (2006) Integrated tribo-SPM for nanotribology. Electron Manuf Eng 21(3):1–10 Gitis N, Daugela A, Xiao J (2006) Integrated tribo-SPM for nanotribology. Electron Manuf Eng 21(3):1–10
Zurück zum Zitat ISO Standard 14577 (2002) Metallic materials—instrumented nanoindentation for hardness and materials parameters, Parts: 1, 2, 3 ISO Standard 14577 (2002) Metallic materials—instrumented nanoindentation for hardness and materials parameters, Parts: 1, 2, 3
Zurück zum Zitat Johnson K (1992) Contact mechanics. Oxford University Press, Oxford Johnson K (1992) Contact mechanics. Oxford University Press, Oxford
Zurück zum Zitat Lau SH, Huang S, Koo A (2000) Characterize low-K and copper films in situ. Semiconductor Int 5–8(7):319–322 Lau SH, Huang S, Koo A (2000) Characterize low-K and copper films in situ. Semiconductor Int 5–8(7):319–322
Zurück zum Zitat Munro RG (2003) Data evaluation theory and practice for materials properties. NIST Publ 960–11:73–82 Munro RG (2003) Data evaluation theory and practice for materials properties. NIST Publ 960–11:73–82
Zurück zum Zitat Nay RJ, Warren OL, Yang D, Wyrobek TJ (2004) Mechanical characterization of low-K dielectric materials using nanoindentation. Microelectronics Eng 75(1):103–110CrossRef Nay RJ, Warren OL, Yang D, Wyrobek TJ (2004) Mechanical characterization of low-K dielectric materials using nanoindentation. Microelectronics Eng 75(1):103–110CrossRef
Zurück zum Zitat Niihira K, Morena R, Hasselman DPH (1982) Evaluation of KIC of brittle solids by the indentation method with low crack-to-indent ratios. J Mat Sci Lett 1:13–16CrossRef Niihira K, Morena R, Hasselman DPH (1982) Evaluation of KIC of brittle solids by the indentation method with low crack-to-indent ratios. J Mat Sci Lett 1:13–16CrossRef
Zurück zum Zitat Oliver WC, Pharr GM (1992) An improved method for instrumented indentation. J Mater Res 7:1547–1553CrossRef Oliver WC, Pharr GM (1992) An improved method for instrumented indentation. J Mater Res 7:1547–1553CrossRef
Zurück zum Zitat Oliver WC, Pharr GM (2004) Measurements of hardness and elastic modulus by instrumented nanoindentation: advances in understanding and refinement to the methodology. J Mater Res 19(1):3–21CrossRef Oliver WC, Pharr GM (2004) Measurements of hardness and elastic modulus by instrumented nanoindentation: advances in understanding and refinement to the methodology. J Mater Res 19(1):3–21CrossRef
Zurück zum Zitat Tabor D (1956) The hardness of metals. Oxford University Press, Oxford Tabor D (1956) The hardness of metals. Oxford University Press, Oxford
Zurück zum Zitat Vella JB, Adihihetty IS, Junker K, Volinski AA (2003) Mechanical properties and fracture toughness of organo-silicate glass (OSG) low-K dielectric thin films for microelectronic applications. Int J Fract 119(120):487–499CrossRef Vella JB, Adihihetty IS, Junker K, Volinski AA (2003) Mechanical properties and fracture toughness of organo-silicate glass (OSG) low-K dielectric thin films for microelectronic applications. Int J Fract 119(120):487–499CrossRef
Metadaten
Titel
Phenomenological nanoindentation technique in quality control of optoelectronics devices
verfasst von
Antanas Daugela
Norm Gitis
Vladimir Gelfeindbein
Publikationsdatum
01.01.2010
Verlag
Springer-Verlag
Erschienen in
Microsystem Technologies / Ausgabe 1-2/2010
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-008-0733-x

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