Anzeige
Erschienen in:
10.02.2016
Preparation of a finely patterned LaNiO3 film via chemical modification
Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 5/2016
EinloggenAktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.
Wählen Sie Textabschnitte aus um mit Künstlicher Intelligenz passenden Patente zu finden. powered by
Markieren Sie Textabschnitte, um KI-gestützt weitere passende Inhalte zu finden. powered by
Abstract
In this work, a LaNiO3 precursor with ultraviolet photosensitivity was prepared using lanthanum acetate and nickel acetate as the starting materials, acetylacetone (AcAc) as a chemical modifier, and a mixture of ethylene glycol monomethyl ether and ethanol as the solvent. A chelation reaction occurred between AcAc and Ni3+ ions in the precursor, forming Ni chelates that were photosensitive to ultraviolet light. The as-prepared chelate decomposed upon ultraviolet irradiation, and the decomposition products significantly reduced the solubility of the lanthanum nickelate (LNO) gel films in organic solvents. Taking advantage of the intrinsic photosensitivity of the LNO gel films, LNO films with fine structures were prepared and characterized. The results revealed that micrometer-sized LNO patterns could be prepared using this microfabrication technique that was derived from a sol–gel method. Both patterned and non-patterned LNO gel films displayed almost the same electrical performances.