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Journal of Materials Science
Erschienen in: Journal of Materials Science 3/2019

15.10.2018 | Electronic materials

Silicon microstructures through the production of silicon nanowires by metal-assisted chemical etching, used as sacrificial material

verfasst von: O. Pérez-Díaz, E. Quiroga-González, N. R. Silva-González

Erschienen in: Journal of Materials Science | Ausgabe 3/2019

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Abstract

A simple, inexpensive and wafer-scale method to obtain Si microstructures is proposed. The method consists in a sequence of steps that include a selective metal-assisted chemical etching process to create regions of Si nanowires that are sacrificed in a post-etching process, leaving microstructures standing. As a proof of concept, Si micropillars with length of 7 µm and diameter of 1.4 µm were fabricated. The advantage of the proposed method is its simplicity, allowing the production of microstructures in a basic chemical laboratory.
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Metadaten
Titel
Silicon microstructures through the production of silicon nanowires by metal-assisted chemical etching, used as sacrificial material
verfasst von
O. Pérez-Díaz
E. Quiroga-González
N. R. Silva-González
Publikationsdatum
15.10.2018
Verlag
Springer US
Erschienen in
Journal of Materials Science / Ausgabe 3/2019
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI
https://doi.org/10.1007/s10853-018-3003-z

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