Synthesis of Ag–Cu–Pd alloy by DC-magnetron sputtering: micromorphology analysis

The present paper aims at analyzing three dimensional (3-D) surface morphologies of Ag–Cu–Pd alloy thin films prepared by direct-current magnetron sputtering by using Argon gas and Ag–Cu–Pd target. These alloys, have been deposited on Si substrates, are investigated at three thicknesses (26, 34 and 40 nm). X-ray diffraction profile of the samples reveals that Cu, Ag and Pd NPs with FCC crystalline are formed in these films. The absorption spectra is applied to study surface Plasmon resonance peaks of Ag, Cu and Pd NPs (observed around 400 nm in visible spectral), which has been widened and shifted to higher wavelengths as the electrical resistivity increases. Applying the combination of atomic force microscopy, fractal analysis and statistical parameters over square area of 1 µm × 1 µm, the thin films were studied to determine the structure and the relationships among the (3-D) micro-textured surfaces. Fractal analysis can quantify basic parameters of (3-D) surface morphology like fractal dimension which is determined by the morphological envelopes method in the present study.