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01.10.2022

Variety of ZnO nanostructured materials prepared by PECVD

verfasst von: Leonid Mochalov, Alexander Logunov, Igor Prokhorov, Maksim Vshivtsev, Mikhail Kudryashov, Yulia Kudryashova, Vladimir Malyshev, Yulia Spivak, Evgeny Greshnyakov, Alexander Knyazev, Diana Fukina, Pavel Yunin, Vyacheslav Moshnikov

Erschienen in: Optical and Quantum Electronics | Ausgabe 10/2022

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Abstract

Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen (H₂–O₂) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques.

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Titel: Variety of ZnO nanostructured materials prepared by PECVD
verfasst von: Leonid Mochalov
Alexander Logunov
Igor Prokhorov
Maksim Vshivtsev
Mikhail Kudryashov
Yulia Kudryashova
Vladimir Malyshev
Yulia Spivak
Evgeny Greshnyakov
Alexander Knyazev
Diana Fukina
Pavel Yunin
Vyacheslav Moshnikov
Publikationsdatum: 01.10.2022
Verlag: Springer US
Erschienen in: Optical and Quantum Electronics / Ausgabe 10/2022
Print ISSN: 0306-8919
Elektronische ISSN: 1572-817X
DOI: https://doi.org/10.1007/s11082-022-03979-z

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