An electrochemical enzyme-free glucose sensor based on bimetallic PtNi materials

This paper investigates a novel electrochemical enzyme-free glucose sensor based on bimetallic PtNi materials. Pt and Ni layer were sputtered on the substrate and then annealed to form bimetallic PtNi materials, which served as sensitive materials for glucose detection. The effect of annealing temperature on the performance of enzyme-free glucose sensors had been studied deeply. Using micro-electromechanical systems (MEMS) technology, a monolithic enzyme-free glucose sensor was fabricated, which integrated with working electrode (WE) and counter electrode (CE) on a chip. The electrochemical results demonstrate that the device exhibits outstanding sensitivity and selectivity for glucose detection, achieving a maximal sensitivity of 1618.15 µA mM⁻¹ cm⁻² in the range of 0–10 mM with a low detection limit of 8.76 µM. The sensor also shows its practical application for glucose detection in human blood serum. Due to its performance and fabrication process, the enzyme-free glucose sensor is therefore well suited for glucose detection and manufacture together with other integrated circuits on a single silicon wafer, which shows potentials in implantable microelectronic systems.