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Erschienen in: Journal of Materials Engineering and Performance 4/2013

01.04.2013

Characterization and Adhesion in Cu/Ru/SiO2/Si Multilayer Nano-scale Structure for Cu Metallization

verfasst von: N. Chawla, S. H. Venkatesh, D. R. P. Singh, T. L. Alford

Erschienen in: Journal of Materials Engineering and Performance | Ausgabe 4/2013

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Abstract

In this study, we have characterized the microstructure, resistivity, and dynamic deformation behavior of Cu/Ru/SiO2 and Cu/SiO2 samples under scratch loading conditions. Cu/Ru/SiO2 samples showed higher elastic recovery and hardness when compared to the Cu/SiO2 samples. In the case of Cu/Ru/SiO2 samples, Ru acts as a glue layer between the Cu and the SiO2 substrate providing both strength and toughness against dynamic loading. Hence, the critical load for delamination is higher for Cu/Ru/SiO2 samples compared to Cu/SiO2 samples. Our results show that Cu/Ru/SiO2 thin films present significant potential to be used in Cu metallization.

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Metadaten
Titel
Characterization and Adhesion in Cu/Ru/SiO2/Si Multilayer Nano-scale Structure for Cu Metallization
verfasst von
N. Chawla
S. H. Venkatesh
D. R. P. Singh
T. L. Alford
Publikationsdatum
01.04.2013
Verlag
Springer US
Erschienen in
Journal of Materials Engineering and Performance / Ausgabe 4/2013
Print ISSN: 1059-9495
Elektronische ISSN: 1544-1024
DOI
https://doi.org/10.1007/s11665-012-0359-0

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