Anzeige
Erschienen in:
01.10.2013
Combined effect of substrate temperature and laser energy density on laser ablated BiFeO3 thin films
Erschienen in: Journal of Materials Science: Materials in Electronics | Ausgabe 10/2013
EinloggenAktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.
Wählen Sie Textabschnitte aus um mit Künstlicher Intelligenz passenden Patente zu finden. powered by
Markieren Sie Textabschnitte, um KI-gestützt weitere passende Inhalte zu finden. powered by
Abstract
Bismuth ferrite (BiFeO3) thin films were prepared on Pt(111)/Ti/SiO2/Si substrates by laser ablation deposition at various substrate temperature (T
sub) and laser energy density (D
L). The combined effect of T
sub and D
L on crystalline phase, preferential orientation and surface morphology of the films were investigated. The microstructure and morphology of the films showed a strong dependence on T
sub and D
L simultaneously. BiFeO3 thin films with single phase could be prepared at T
sub-D
L of 893 K−1 J/cm2, 943 K−2 J/cm2 and 963 K−3 J/cm2, respectively. Film deposited at T
sub = 963 K and D
L = 3 J/cm2 exhibited better ferroelectric property due to the combination of high (111) preferential orientation, dense surface morphology and less Fe2+ content.