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Erschienen in: Microsystem Technologies 4/2022

14.09.2020 | Technical Paper

Design, simulation and analysis of RF MEMS capacitive shunt switches with high isolation and low pull-in-voltage

verfasst von: K. Girija Sravani, D. Prathyusha, Ch. Gopichand, Surya Manoj Maturi, Ameen Elsinawi, Koushik Guha, K. Srinivasa Rao

Erschienen in: Microsystem Technologies | Ausgabe 4/2022

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Abstract

This paper presents the design a capacitive shunt type RF-MEMS switch with high isolation, high switching speed and low actuation voltage for Ka-band applications. The proposed RF-MEMS switch has chosen different structures to reduce the actuation voltage. This paper investigates various analysis such as Electromechanical and RF characteristics of the proposed switch. The beam material taken as the gold and the dielectric is taken as Si3N4 with ℰr as 7.5 and the pull-in voltage of proposed switch obtained as 3.37 V. The proposed different RF-MEMS switches have been analyzed over the range of 26.5–40 GHz frequency. The clamped-clamped structure type RF MEMS Switch is having high isolation as − 46.37 dB at 40 GHz. The perfection of RF losses makes these switches as a good choice for a high frequency of K-band.

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Metadaten
Titel
Design, simulation and analysis of RF MEMS capacitive shunt switches with high isolation and low pull-in-voltage
verfasst von
K. Girija Sravani
D. Prathyusha
Ch. Gopichand
Surya Manoj Maturi
Ameen Elsinawi
Koushik Guha
K. Srinivasa Rao
Publikationsdatum
14.09.2020
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 4/2022
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-020-05021-2

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