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Microsystem Technologies
Erschienen in: Microsystem Technologies 10/2015

01.10.2015 | Technical Paper

Electrical contact performance of MEMS acceleration switch fabricated by UV-LIGA technology

verfasst von: Zhijian Zhou, Weirong Nie, Zhanwen Xi, Xiaofeng Wang

Erschienen in: Microsystem Technologies | Ausgabe 10/2015

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Abstract

This paper expanded a micro-contact resistance model to investigate the contact performance for a acceleration switch fabricated by UV-LIGA (Ultra-violet Lithographie, Galvanoformung and Abformung) technology. Based on the relationship between the contact radius a and electron mean free path λ, three different contact resistance models have been analyzed. The material properties (elastic modulus E, hardness H and Poisson’s ratio v) and surface topographic parameters (asperity summit radius r, standard deviation of height distribution σ, and surface density of asperity) have been studied to evaluate the contact resistance-load characteristics. The results show that the theoretical prediction of contact resistance-load characteristics correlates well with the experimental results except there exists experimental discrepancy. The discrepancy between theoretical predictions and experimental results mainly is due to the contaminations, errors from assumptions, surface oxidation and external environmental conditions.
Vorheriger Artikel Low cost packaging for gas sensors
Nächster Artikel Extracellular biosynthesis and characterization of gold nanoparticles using the fungus Penicillium chrysogenum

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Metadaten
Titel
Electrical contact performance of MEMS acceleration switch fabricated by UV-LIGA technology
verfasst von
Zhijian Zhou
Weirong Nie
Zhanwen Xi
Xiaofeng Wang
Publikationsdatum
01.10.2015
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 10/2015
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-015-2621-5

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