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Erschienen in:
2013 | OriginalPaper | Buchkapitel
4. Fabrication and Process Modeling
verfasst von : Joseph C. Doll, Beth L. Pruitt
Erschienen in: Piezoresistor Design and Applications
Verlag: Springer New York
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Abstract
A necessary precondition for successful piezoresistor design is an accurate model for the fabrication process. In particular, we require a model that can predict the dopant concentration profile of the piezoresistor in terms of fabrication input parameters (e.g. predeposition time and temperature). The dopant concentration profile determines the charge carrier and electrical resistivity profiles. As we saw in the last section, these quantities determine the noise, sensitivity and resolution of a sensor. This chapter will focus on accurately modeling the most common piezoresistor fabrication techniques.