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2017 | OriginalPaper | Buchkapitel

11. Gate Injection Transistors: E-mode Operation and Conductivity Modulation

verfasst von : Tetsuzo Ueda

Erschienen in: Power GaN Devices

Verlag: Springer International Publishing

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Abstract

This chapter describes an enhancement-mode (E-mode) GaN transistor named as Gate Injection Transistor (GIT) and various technologies to improve the performances. The operation principle of the GIT as well as its state-of-the-art DC and switching performances is described after summarizing reported E-mode GaN power transistors. Status of the reliability including Current collapse is summarized, followed by the results of the application of the GIT to practical power switching circuits targeting at high efficiencies. Future technologies to improve the performances and to extract the potential are also described.

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Literatur
1.
Zurück zum Zitat Khan MA, Van Hove JM, Kuznia JN, Olson DT (1991) High electron mobility GaN/AlxGa1-xN heterostructures grown by low-pressure metalorganic chemical vapor deposition. Appl Phys Lett 58:2408 Khan MA, Van Hove JM, Kuznia JN, Olson DT (1991) High electron mobility GaN/AlxGa1-xN heterostructures grown by low-pressure metalorganic chemical vapor deposition. Appl Phys Lett 58:2408
2.
Zurück zum Zitat Ambacher O, Smart J, Shealy JR, Weimann NG, Chu K, Murphy M, Schaff WJ, Eastman LF, Dimitrov R, Wittmer L, Stutzmann M, Rieger W, Hilsenbeck J (1999) Two-Dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures. J Appl Phys 85:3222 Ambacher O, Smart J, Shealy JR, Weimann NG, Chu K, Murphy M, Schaff WJ, Eastman LF, Dimitrov R, Wittmer L, Stutzmann M, Rieger W, Hilsenbeck J (1999) Two-Dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures. J Appl Phys 85:3222
3.
Zurück zum Zitat Uemoto Y, Hikita M, Ueno H, Matsuo H, Ishida H, Yanagihara M, Ueda T, Tanaka T, Ueda D (2007) Gate Injection Transistor (GIT)—A normally-off AlGaN/GaN power transistor using conductivity modulation. IEEE Trans Electron Device 54:3393 Uemoto Y, Hikita M, Ueno H, Matsuo H, Ishida H, Yanagihara M, Ueda T, Tanaka T, Ueda D (2007) Gate Injection Transistor (GIT)—A normally-off AlGaN/GaN power transistor using conductivity modulation. IEEE Trans Electron Device 54:3393
4.
Zurück zum Zitat Sugiura S, Kishimoto S, Mizutani T, Kuroda M, Ueda T, Tanaka T (2008) Normally-off AlGaN/GaN MOSHFETs with HfO2 gate oxide. Phys Status Solidi C 5:1923 Sugiura S, Kishimoto S, Mizutani T, Kuroda M, Ueda T, Tanaka T (2008) Normally-off AlGaN/GaN MOSHFETs with HfO2 gate oxide. Phys Status Solidi C 5:1923
5.
Zurück zum Zitat Cai Y, Zhou Y, Chen KJ, Lau KM (2005) High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment. IEEE Electron Dev Lett 26:435 Cai Y, Zhou Y, Chen KJ, Lau KM (2005) High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment. IEEE Electron Dev Lett 26:435
7.
Zurück zum Zitat Meneghini M, Scamperle M, Pavesi M, Manfredi M, Ueda T, Ishida H, Tanaka T, Ueda D, Meneghesso G, Zanoni E (2010) Electron and hole-related luminescence processes in gate injection transistors. Appl Phys Lett 97:033506 Meneghini M, Scamperle M, Pavesi M, Manfredi M, Ueda T, Ishida H, Tanaka T, Ueda D, Meneghesso G, Zanoni E (2010) Electron and hole-related luminescence processes in gate injection transistors. Appl Phys Lett 97:033506
8.
Zurück zum Zitat Ishida M, Ueda T, Tanaka T, Ueda D (2013) GaN on Si technologies for power switching Devices. IEEE Trans Electron Device 60:3053 Ishida M, Ueda T, Tanaka T, Ueda D (2013) GaN on Si technologies for power switching Devices. IEEE Trans Electron Device 60:3053
9.
Zurück zum Zitat Ueda T, Ishida M, Tanaka T, Ueda D (2014) GaN transistors on Si for switching and high-frequency applications. Jpn J Appl Phys 53:100214 Ueda T, Ishida M, Tanaka T, Ueda D (2014) GaN transistors on Si for switching and high-frequency applications. Jpn J Appl Phys 53:100214
10.
Zurück zum Zitat Morita T, Handa H, Ujita S, Ishida M, Ueda T (2014) 99.3 % Efficiency of boost-up converter for totem-pole bridgeless PFC using GaN gate injection transistors. PCIM Europe, Nuremberg, Germany, May 2014 Morita T, Handa H, Ujita S, Ishida M, Ueda T (2014) 99.3 % Efficiency of boost-up converter for totem-pole bridgeless PFC using GaN gate injection transistors. PCIM Europe, Nuremberg, Germany, May 2014
11.
Zurück zum Zitat Tanaka K, Ishida M, Ueda T, TanakaT (2013) Effects of deep trapping states at high temperatures on transient performance of AlGaN/GaN heterostructure field-effect transistors. Jpn J Appl Phys 52:04CF07 Tanaka K, Ishida M, Ueda T, TanakaT (2013) Effects of deep trapping states at high temperatures on transient performance of AlGaN/GaN heterostructure field-effect transistors. Jpn J Appl Phys 52:04CF07
12.
Zurück zum Zitat Kaneko S, Kuroda M, Yanagihara M, Ikoshi A, Okita H, Morita T, Tanaka K, Hikita M, Uemoto Y, Takahashi S, Ueda T (2015) Current-collapse-free operations up to 850 V by GaN-GIT utilizing hole injection from drain. In: International symposium on power semiconductor devices and ICs (ISPSD) 2015, Hong Kong, May 2015 Kaneko S, Kuroda M, Yanagihara M, Ikoshi A, Okita H, Morita T, Tanaka K, Hikita M, Uemoto Y, Takahashi S, Ueda T (2015) Current-collapse-free operations up to 850 V by GaN-GIT utilizing hole injection from drain. In: International symposium on power semiconductor devices and ICs (ISPSD) 2015, Hong Kong, May 2015
13.
Zurück zum Zitat Morita T, Tamura S, Anda Y, Ishida M, Uemoto Y, Ueda T, Tanaka T, Ueda D (2011) 99.3 % Efficiency of three-phase inverter using GaN-based gate injection transistors. In: Proceedings of 26th IEEE applied power electronics conference and exposition (APEC 2011), Fort Worth, USA, p 481, March 2011 Morita T, Tamura S, Anda Y, Ishida M, Uemoto Y, Ueda T, Tanaka T, Ueda D (2011) 99.3 % Efficiency of three-phase inverter using GaN-based gate injection transistors. In: Proceedings of 26th IEEE applied power electronics conference and exposition (APEC 2011), Fort Worth, USA, p 481, March 2011
14.
Zurück zum Zitat Kajitani R, Tanaka K, Ogawa M, Ishida H, Ishida M, Ueda T (2014) A novel high-current density GaN-based normally-off transistor with tensile strained quaternary InAlGaN barrier. Extended abstract of international conference on solid state devices and materials, Tsukuba, Japan, E-3-2, September 2014 Kajitani R, Tanaka K, Ogawa M, Ishida H, Ishida M, Ueda T (2014) A novel high-current density GaN-based normally-off transistor with tensile strained quaternary InAlGaN barrier. Extended abstract of international conference on solid state devices and materials, Tsukuba, Japan, E-3-2, September 2014
15.
Zurück zum Zitat Uemoto Y, Morita T, Ikoshi A, Umeda H, Matsuo H, Shimizu J, Hikita M, Yanagihara M, Ueda T, Tanaka T, Ueda D (2009) GaN monolithic inverter IC using normally-off gate injection transistors with planar isolation on Si substrate. IEEE IEDM technical digest, Baltimore, USA, p 165, Dec 2009 Uemoto Y, Morita T, Ikoshi A, Umeda H, Matsuo H, Shimizu J, Hikita M, Yanagihara M, Ueda T, Tanaka T, Ueda D (2009) GaN monolithic inverter IC using normally-off gate injection transistors with planar isolation on Si substrate. IEEE IEDM technical digest, Baltimore, USA, p 165, Dec 2009
16.
Zurück zum Zitat Ujita S, Kinoshita Y, Umeda H, Morita T, Tamura S, Ishida M, Ueda T (2014) A compact GaN-based DC-DC converter IC with high-speed gate drivers enabling high efficiencies. International symposium on power semiconductor devices and ICs (ISPSD), Wikoloa, USA, B1L-A-1, June 2014 Ujita S, Kinoshita Y, Umeda H, Morita T, Tamura S, Ishida M, Ueda T (2014) A compact GaN-based DC-DC converter IC with high-speed gate drivers enabling high efficiencies. International symposium on power semiconductor devices and ICs (ISPSD), Wikoloa, USA, B1L-A-1, June 2014
17.
Zurück zum Zitat Umeda H, Kinoshita Y, Ujita S, Morita T, Tamura S, Ishida M, Ueda T (2014) Highly efficient low-voltage DC-DC converter at 2-5 MHz with high operating current using GaN gate injection transistors. PCIM Europe, Nuremberg, Germany, p 45, May 2014 Umeda H, Kinoshita Y, Ujita S, Morita T, Tamura S, Ishida M, Ueda T (2014) Highly efficient low-voltage DC-DC converter at 2-5 MHz with high operating current using GaN gate injection transistors. PCIM Europe, Nuremberg, Germany, p 45, May 2014
Metadaten
Titel
Gate Injection Transistors: E-mode Operation and Conductivity Modulation
verfasst von
Tetsuzo Ueda
Copyright-Jahr
2017
DOI
https://doi.org/10.1007/978-3-319-43199-4_11