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Journal of Materials Science

Erschienen in:

11.10.2016 | Original Paper

Isothermal differential dilatometry based on X-ray analysis applied to stress relaxation in thin ion-beam-sputtered Pt films

verfasst von: Wolfgang Gruber, Carsten Baehtz, Thomas Geue, Jochen Stahn, Harald Schmidt

Erschienen in: Journal of Materials Science | Ausgabe 3/2017

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Abstract

Relaxation of stress and point defects in ion-beam-sputtered Pt films with a thickness of 20 and 40 nm during isothermal annealing was investigated. First, isothermal differential dilatometry measurements based on X-ray analysis were carried out between 130 and 400 °C. They show that the relaxation of compressive stress is associated with the formation of vacancies at the surface. From the measurements, an activation enthalpy of 0.14 eV was estimated for the stress relaxation process. In addition, self-diffusion experiments of Pt were carried out on the same type of films using stable ¹⁹⁴Pt tracer. From secondary ion mass spectrometry on samples annealed for longer times, an activation enthalpy of 0.5 eV for Pt diffusion in grain boundaries was estimated. The influence of vacancy creation at the surface, vacancy transport, and the annihilation of non-equilibrium bulk interstitials and thermally created vacancies on stress relaxation is discussed.

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Titel: Isothermal differential dilatometry based on X-ray analysis applied to stress relaxation in thin ion-beam-sputtered Pt films
verfasst von: Wolfgang Gruber
Carsten Baehtz
Thomas Geue
Jochen Stahn
Harald Schmidt
Publikationsdatum: 11.10.2016
Verlag: Springer US
Erschienen in: Journal of Materials Science / Ausgabe 3/2017
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI: https://doi.org/10.1007/s10853-016-0458-7

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