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Erschienen in: Tribology Letters 1/2020

01.03.2020 | Original Paper

Friction–Load Relationship in the Adhesive Regime Revealing Potential Incapability of AFM Investigations

verfasst von: Junhui Sun, Yangyang Lu, Yanqing Feng, Zhibin Lu, Guang’an Zhang, Yanping Yuan, Linmao Qian, Qunji Xue

Erschienen in: Tribology Letters | Ausgabe 1/2020

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Abstract

Reduced friction with increasing normal load in the adhesive regime is revealed by vdW-corrected DFT calculations of various rigid junction models such as Graphene/Graphene, h-BN/h-BN, and Graphene/h-BN. The origin of the friction–load relationship arises from the decreased sliding potential corrugation with increased normal load in the attractive regime of the interfacial separation above its equilibrium. The “negative” coefficient of friction behavior, which is mainly dominated by van der Waals attraction, is expected to appear in many interfaces without significant deformation. However, the friction behavior presented here may be inaccessible to atomic forces microscope (AFM) due to the intrinsic instability. The instruments such as interfacial forces microscope with force-feedback sensor or quartz tuning forks with large stiffness are proposed to measure friction behaviors in the entire attractive region.

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Metadaten
Titel
Friction–Load Relationship in the Adhesive Regime Revealing Potential Incapability of AFM Investigations
verfasst von
Junhui Sun
Yangyang Lu
Yanqing Feng
Zhibin Lu
Guang’an Zhang
Yanping Yuan
Linmao Qian
Qunji Xue
Publikationsdatum
01.03.2020
Verlag
Springer US
Erschienen in
Tribology Letters / Ausgabe 1/2020
Print ISSN: 1023-8883
Elektronische ISSN: 1573-2711
DOI
https://doi.org/10.1007/s11249-019-1263-7

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